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| 題 名 | 電漿輔助化學氣相蒸鍍簡介 |
|---|---|
| 作 者 | 馬寧元; | 書刊名 | 金屬工業 |
| 卷 期 | 29:1 1995.01[民84.01] |
| 頁 次 | 頁30-42 |
| 分類號 | 472.16 |
| 關鍵詞 | 化學氣相蒸鍍; 電漿; 輔助; |
| 語 文 | 中文(Chinese) |
| 中文摘要 | 本文主要目的在探討PACVD製程原理;輝光放電電漿之物理與化學特性;PACVD與工程被覆物/表面處理之相互作用;被覆物形成之 反應機構;影響PAVCD蒸鍍速率之動力與熱力效應;高能量、低能量離子/中性微粒之撞擊;微電子材料與工業應用PACVD技術之範圍及 PACVD較傳統蒸鍍技術潛在之優點。 |
| 英文摘要 | The main purpose of this article is to investigate the processing principles of PACVD Physical and chemical characters of glow discharge Plasma, the reciprocal interactions of PACVD with engineering coatings and surface treatment; the reaction mechanism of coatings formation; the kinetic and thermal effects which influence the deposition rate of PACVD processing; collisions of high energy, low energy ions with neutral particles; the scope of micro electric materials and industries application for PACVD technology. Also the potential advantages of PACVD technology over traditional deposition technology will also be discussed in this article. |
本系統中英文摘要資訊取自各篇刊載內容。