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題 名 | On the Interfacial Mechanical Properties of SiOx-Coated Metal Wires=被覆氧化矽薄膜之金屬線材界面機械性質研究 |
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作 者 | 薛富盛; 蕭銘華; | 書刊名 | 興大工程學報 |
卷 期 | 8:2 1997.06[民86.06] |
頁 次 | 頁11-19 |
分類號 | 440.35 |
關鍵詞 | 氧化矽; 電漿輔助化學氣相沈積; 界面; 鍵結強度; 剪應力強度; SiOx; PECVD; Interface; Bonding strength; Shear strength; |
語 文 | 英文(English) |
中文摘要 | 本研究以週期性斷裂法測量氧化矽/金(SiOx/Au)及氧化矽/銅(SiOx/Cu)等兩 系統之界面機械性質,並利用彈性模型來分析鍍著氧化矽薄膜之金屬線材在單軸間拉伸變形 下之應力狀態。 氧化矽之鍍著以電漿輔助化學氣相沈積法為之。經拉伸試驗後,發現氧化矽鍍膜之破裂型態 隨界面鍵結強度而變化。氧化矽 / 金之界面強度經測量僅為 0.23 MPa,由於鍵結強度太弱 而造成拉伸時鍍膜容易剝落,而其裂紋和拉伸軸約略成 45 °夾角。 相對地,氧化矽 / 銅 之界面強度值至少為 0.885 MPa,而其鍍膜裂紋皆垂直於拉伸軸且形成週期性排列,經由週 期性裂紋寬度求得界面剪應力值為 49.5 MPa。 |
英文摘要 | The interfacial mechanical properties of two systems, SiOx/Au and SiOx /Cu, were measured by a modified periodic cracking method. The state of stress in the SiOx-coated metal wires with cylindrical symmetry were analyzed using a classic model of continuum elasticity. Experimentally the measurement was carried out by a uniaxial tensile test. Specimens for the tensile test were prepared by depositing a thin layer of SiOx on the metal wires by a plasma enhanced chemical vapor deposition ( PECVD ) technique. After tensile loading, it was found that the fracture morphology of the SiOx coating depended upon the bonding strength of the interfaces. For a weak interface such as SiOx/Au with a measured bonding strength of 0.230 MPa, debonding at the interface prevailed and most of the cracks in the SiOx coating were inclined to the tensile axis by 45 °.In contrast, cracks in the coating of a strong interface such as SiOx/Cu showed periodicity and were perpendicular to the tensile axis. The bonding strength of the interface was estimated to be, at least, 0.885 MPa, while the ultimate shear strength was measured to be 49.5 MPa. |
本系統中英文摘要資訊取自各篇刊載內容。