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題名 | 在底層電極上以常溫成長氮化鋁薄膜之研究=The Study of AlN Thin Film Grown on Bottom Electrode under Room Temperature Condition |
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作者 | 黃靜茹; 黃興祿; 陳亮斌; 謝光宇; Hwang, J. L.; Huang, H. L.; Chen, L. B.; Hsieh, K. Y.; |
期刊 | 材料科學與工程 |
出版日期 | 200203 |
卷期 | 34:1 2002.03[民91.03] |
頁次 | 頁55-60 |
分類號 | 440.34 |
語文 | chi |
關鍵詞 | 磁控濺渡; 氮化鋁; 柱狀結構; Magnetron sputtering; AlN; Column structure; |