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題名 | Characteristics of C-axis Oriented AlN Films Grown by Reactive DC Magnetron Sputtering=使用反應性直流磁控濺鍍法成長C軸排向氮化鋁薄膜 |
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作者 | 洪榮昌; 鄭建銓; Horng, Rong-chang; Cheng, Chien-chuan; |
期刊 | 四海學報 |
出版日期 | 199904 |
卷期 | 13 1999.04[民88.04] |
頁次 | 頁113-122 |
分類號 | 440.34 |
語文 | eng |
關鍵詞 | 氮化鋁; 反應性直流磁控濺鍍; X光繞射儀; 掃描式電子顯微境; Aluminum nitride; Reactive DC magnetron sputtering; X-ray diffraction; Scanning electron microscopy; |