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題名 | 電漿化學氣相沈積法製含錫薄膜的光學及電氣性質 |
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作者 | 陳克紹; 王國章; | 書刊名 | 材料科學 |
卷期 | 22:1 1990.03[民79.03] |
頁次 | 頁51-61 |
分類號 | 468 |
關鍵詞 | 化學; 光學; 含錫; 沈積法; 性質; 氣相; 電氣; 電漿; 薄膜; |
語文 | 中文(Chinese) |
英文摘要 | Organic tin oxide (SnCO) films were deposited by plasma chemical vapor deposition oftetramethyltin (TMT) . The plasma condition and post annealing have effect on the chemical structure, optical property and electrical conductivity of deposited films. The power (W) and the vaporpressure (P) of TMT are the most influential factors for the properties of films. The deposited filmsprepared at low value of W/P tend to be polymeric, whereas metallic films were deposited at highervalue of W/P. Annealing of the deposited films produces a tin oxide composition; thus, it couldimprove the transmittance of metallic film from 5 to above 80 after annealing at 400℃, whiletransparent organic films could increase the conductivity without decaying the transmittance invisible spectrum. |
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