查詢結果分析
來源資料
相關文獻
- 電漿鍍膜技術及電漿表面處理實驗室簡介
- 含銅氮化鈦抗菌鍍膜用於衛浴黃銅的保固性
- 氫氧基磷灰石/鈦磁控濺鍍膜微結構及性質研究
- 反應性磁控濺鍍氧化鎢薄膜氧含量對其電致色變性質之影響
- 氧化鉿薄膜之漏電流分析
- Characteristics of C-axis Oriented AlN Films Grown by Reactive DC Magnetron Sputtering
- Growth of Highly C-axis Oriented AlN Films on GaAs Substrates
- Effects of Oxygen in Reactive Ion-assisted Bipolar DC Mmagnetron Sputtering of Ta[feaf]O邚and SiO[feaf]Films
- 以射頻磁控濺鍍法製備高介電鈦酸鍶鋇薄膜應用於動態隨機存取記憶體之研究
- 離子束沈積含氮類鑽碳膜之結構與光學性質
頁籤選單縮合
| 題 名 | 電漿鍍膜技術及電漿表面處理實驗室簡介=Introduction of Plasma Assisted Coating Technology and the Plasma Surface Treatment Laboratory of MIRDC |
|---|---|
| 作 者 | 林昭憲; 李文浚; | 書刊名 | 機械工業 |
| 卷 期 | 304 2008.07[民97.07] |
| 頁 次 | 頁48-55 |
| 專 輯 | 熱處理與表面處理技術專輯 |
| 分類號 | 472.16 |
| 關鍵詞 | 電漿鍍膜; 磁控濺鍍; 抗沾黏鍍膜; 類鑽碳膜; 表面金屬化; 抗菌鍍膜; Plasma assisted coating; Magnetic sputtering; Anti-sticking coating; Diamond-like carbon coating; Surface metallizing; Anti-bacterial coating; |
| 語 文 | 中文(Chinese) |
| 中文摘要 | 真空電漿鍍膜技術是一種環保的高品質鍍膜製程,廣泛用來提升工模具和機械零件的性能,或是賦予表面特殊的功能,金屬中心電漿表面處理實驗室已研究多項優異的功能性鍍膜技術並累積多年的實務經驗,未來將繼續建構複合電漿源鍍膜技術平臺,以期成為國內金屬相關產業創新研發的技術合作夥伴。 |
| 英文摘要 | Vacuum plasma assisted coating technology is an environmental high quality coating process which could broadly upgrade the performance of the tools, molds(dies) and mechanical parts and endowed with special functions for the surface. Plasma surface treatment laboratory of MIRDC has developed several excellent functional coating technologies in the past few years and cumulate many years practical experiences. We will continuously establish the platform for the coating technologies of the composite plasma source and wish to be the partner on the innovation of R&D for the metal related industries in Taiwan. |
本系統中英文摘要資訊取自各篇刊載內容。