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題 名 | Pore Structure Modification by Chemical Vapor Deposition in Inorganic Membrane-Numerical Analysis=化學氣相沉積修飾無機多孔膜之孔洞構造--數值分析 |
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作 者 | 李良倫; 洪隆章; 洪儒生; 蔡大翔; | 書刊名 | Journal of the Chinese Institute of Chemical Engineers |
卷 期 | 30:2 1999.03[民88.03] |
頁 次 | 頁105-115 |
分類號 | 460.02 |
關鍵詞 | 化學氣相沉積; 修飾無機多孔膜; 孔洞構造; 數值分析; Pore structure; Chemical vapor deposition; Kinetics; Pore size distribution; |
語 文 | 英文(English) |
中文摘要 | 本文以數值方法分析化學氣相沉積修飾無機多膜之孔洞構造的效果,我們使用兩 種孔洞構造模型,折曲度定值的毛細管模型,與折曲度可變的隨機重疊球模型,若使用之化 學氣相沉積系反應性高,則修飾深度淺;反之,若沉積系反應性低,則修飾深度深入。修飾 宜按孔洞尺寸與其分佈選擇恰當之沉積速率,若沉積速率高,則納米尺寸的孔洞將快速堵死 。修飾前之孔洞分佈對�E牲透過率換取孔洞縮小效果有重要的影響,常規分佈的孔洞尺寸縮 小比偏向小孔尺寸的對數分佈縮小有效,對數分佈的孔洞甚至可能�E牲透過率,卻得到平均 孔徑不減小反而增大的結果。氣相反應可有助於減少孔洞尺寸的分散寬度,但其效果極小。 |
英文摘要 | Pore structure modification of an inorganic membrane through chemical vapor deposition is analyzed numerically. Two pore structures, a capillary model with a fixed tortuosity and a randomly overlapped shere model with a variable tortuosity, are used. For a deposition system of high reactivity, the modification depth in membrane is shallow. On the other hand, if the reactivity of deposition system is low, the modified depth is long. The deposition rate should be carefully selected according to the pore size and its distribution. A pore of nano-size will be clogged instantly, if a reaction system of fast deposition rate is applied. The initial pore size distribution is a crucial factor in pore narrowing at the expense of permeance. The average pore size of normal distribution is narrowed down more efficiently than a log-normal distribution that skews to small pores. A log-normal distribution of significant standard deviation may have an increase in average pore size, despite a permeance loss. The gas-phase reaction can help narrow the pore size distribution, but unfortunately its effect is usually very small. |
本系統中英文摘要資訊取自各篇刊載內容。