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題 名 | 準分子雷射鍍製碳膜=Deposition of Carbon Films by Excimer Laser Irradiation |
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作 者 | 方治國; 何惠雯; 余佳凝; | 書刊名 | 宜蘭大學工程學刊 |
卷 期 | 6 2010.03[民99.03] |
頁 次 | 頁43-52 |
分類號 | 440.34 |
關鍵詞 | 準分子雷射; 環己烷; 拉曼光譜; 原子力顯微鏡; Excimer laser; Cyclohexane; Carbon film; AFM; Raman spectrum; |
語 文 | 中文(Chinese) |
中文摘要 | 碳膜主要是由元素碳所構成之薄膜鍍層,包括化學氣相沈積鑽石膜、石墨膜、無定形碳膜(類鑽碳膜)、及電漿高分子膜等。碳膜具有獨特且可調整之各種特性組合,包括高硬度及高耐磨耗性、化學鈍性、及磨潤特性等。然而其其缺點是成膜製程通常須在真空系統進行,本研究則於大氣環境及室溫下利用脈衝式雷射鍍製碳膜。本研究使用ArF準分子雷射(波長193 nm)照射於浸泡在環己烷之單晶矽表面以鍍製碳膜。鍍膜以原子力顯微鏡觀察其表面形貌,其平均粗糙度(Ra)約0.275 nm。碳膜經拉曼光譜儀(激發雷射波長532 nm)分析其結構特徵,除G band外,可發現β-SiC拉曼譜峰。 |
英文摘要 | Carbon films are thin film coatings consisting predominantly of the chemical element carbon. Which include CVD diamond films, graphite films, amorphous carbon films (diamond-like carbon, DLC) as well as plasma polymer films. Carbon films possess unique and adjustable combination of properties such as high hardness and wear resistance, chemical resistance and good tribological performances. However, the disadvantage is that their deposition process generally need vacuum systems. In this study, carbon films have been produced through pulsed-laser deposition in the atmosphere at room temperature.ArF Excimer laser (λ= 193 nm) irradiation of a single-crystalline silicon surface immersed under cyclohexane liquid is demonstrated to form carbon films. Atomic force microscopy has been used to study the surface topography of the deposited carbon films. The average surface roughness (Ra) is about 0.275 nm. Raman analyses at 532 nm excitation wavelength are employed to characterize the structure of the deposited films. In addition to the G band, Raman peak due to β-SiC is observed. |
本系統中英文摘要資訊取自各篇刊載內容。