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頁籤選單縮合
題 名 | A Self-Tuning Run-By-Run Process Controller for Processes Subject to Random Disturbances=適用於隨機製程干擾下之批次製程控制器 |
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作 者 | 郭瑞祥; 陳進忠; 陳正剛; 呂秀雄; | 書刊名 | 中國工程學刊 |
卷 期 | 22:5 1999.09[民88.09] |
頁 次 | 頁627-638 |
分類號 | 448.944 |
關鍵詞 | 批次製程控制; 指數加權移動平均法; 製程品管; Run-by-run process control; EWMA algorithm; Quality control; |
語 文 | 英文(English) |
中文摘要 | 在本文中我們介紹一個隨著製程隨機變化能動態選擇控制參數的「自我調適批次 製程控制器」。此批次控制器有以下兩個模組: 自我調適循環驅動模組和批次回饋控制模組 。在自我調適循環驅動模組中,我們用兩個指數加權移動平均管制圖來偵測製程是否有大速 移或中速移,並藉此驅動自我調適循環。在批次回饋控制模組中,我們藉著調適控制參數。 及微調控制模型,然後用新的控制模型產生下一批次的輸入值,以補償由製程輸出值偏離目 標值所造成的偏差。由蒙地卡羅的模擬結果,我們驗證了我們所提出的「自我調適批次製程 控制器」較現有固定控制參數的批次控制器要來的有效。 |
英文摘要 | In this paper a self-tuning run-by-run process controller is presented. The controller has the capability of choosing a control parameter dynamically in response to the underlying process disturbances. There are two modules in this controller: a self-tuning loop trigger module and a run-by-run feedback control module. In the self-tuning loop trigger module, two EWMA control charts are used sequentially to determine if there is a large or medium shift in the process output and to trigger a new self-tuning loop accordingly. In the run-by-run feedback control module, the control parameter and control model are re-tuned sequentially and a new process recipe is generated, on a run- by-run basis, to compensate for the process output's deviation from the target. Monte Carlo simulation results show that the self-tuning run-by-run process controller is superior to the current run-by-run process controller with a fixed control parameter. |
本系統中英文摘要資訊取自各篇刊載內容。