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題名 | Diamond-Like Carbon Film Deposition and Field Emission Display Investigation=類鑽膜沉積與場發射顯示器研究 |
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作者姓名(中文) | 羅吉宗; 余正賢; | 書刊名 | 大同學報 |
卷期 | 26 1996.11[民85.11] |
頁次 | 頁277-286+419 |
分類號 | 448.5 |
關鍵詞 | 類鑽膜; 沉積; 場發射顯示器; |
語文 | 英文(English) |
中文摘要 | 場發射電子顯示器,由陰極板錐尖上的碳類鑽膜和在ITO玻璃上的已攙雜磷材料陽極板組成。在(100)矽晶片上以微影蝕刻技術製作微錐尖,然後在微錐尖表面沉積碳類鑽膜。以2.45GHz微波電漿化學氣相沉積法和準分子脈衝雷射法在p型(100)矽晶片和金屬鉬錐尖基板上分別沉積碳類鑽膜。以拉曼光譜、掃描式電子顯微鏡、電子光譜化學分析評估膜的特性並量此膜之1-V電性曲線。 |
英文摘要 | FED devices consist of DLC film on tips cathode and doped phosphor materials on ITO glass anode plate. Bulk micromaching technique was used to fabricate micro-tips on Si (100) substrate, then DLC film was deposited on micro-tips surface. Microwave (2.45GHZ) plasma chemical vapor deposition and Excimer (XeCl 308nm) pulsed laser deposition process were used to deposite diamond like carbon film on p type Si(100) and Mo substrates. Films properties were evaluated by Raman spectroscopy, SEM, ESCA, and electrical characteristics measurement. |
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