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題名 | 雙光束陰影疊紋干涉儀應用於軟性電子應力之研究=Investigation of Flexible Electronics Stress by the Double Beam Shadow Moire' Interferometer |
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作者 | 黃國鼎; 羅晏明; 廖智群; 陳錫釗; | 書刊名 | 真空科技 |
卷期 | 24:2 2011.06[民100.06] |
頁次 | 頁82-87 |
分類號 | 448.5 |
關鍵詞 | 陰影疊紋; 相位偏移干涉法; 殘留應力; Stoney修正公式; 軟性電子; Shadow Moiré; Phase shifting interferometry; Residual stress; Stoney correction formula; Flexible electronics; |
語文 | 中文(Chinese) |
中文摘要 | 本研究主要是將陰影疊紋 (Shadow Moiré) 干涉術以雙光束架構結合相位偏移干涉法(Phase Shifting Interferometry, PSI) 並應用在軟性基板的應力量測上。疊紋干涉術為一種量測大變形之陰影疊紋干涉儀,其優勢是它可以做全場域的量測、非接觸性並且實驗架設簡單。研究中引入了相位移法,它是對軟性基板表面快速擷取數張干涉圖,利用三步還原相位法進行光柵條紋消除,其目的是在於疊紋干涉的精度提升。本系統特色只要於干涉圖形中左右各出現一條疊紋便可以計算出變形表面的曲率半徑,再配合 Stoney 修正公式,即可測得軟性基板薄膜殘留應力。 |
英文摘要 | The purpose of this research was to combine the shadow moiré interferometry with the phase shifting interferometry (PSI) by the two beam system and measure the stress of fl exible substrate.The feature of shadow moiré interferometry is for large deformation and the advantages are fullfield of view, non-contact and simple installation. The phase shifting interferometry use the three step measurements of interferogram intensity to remove the noise caused by grating and improve the accuracy. The characteristic of this system is just to measure the distance between the left and right fringe on the pattern and solve the curvature of deformed surface. Hence, the residual stress could calculate by the Stoney correction formula for the fl exible electronics. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。