頁籤選單縮合
題名 | 準分子退火矽膜之再結晶機制研究=Recrystallization Mechanism of Polycrystalline Silicon Thin Films Fabricated by Excimer Laser Annealing |
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作者姓名(中文) | 郭啟全; | 書刊名 | 工業材料 |
卷期 | 257 2008.05[民97.05] |
頁次 | 頁206-214 |
分類號 | 448.552 |
關鍵詞 | 準分子雷射退火; 線上光學檢測; 非晶矽膜; 再結晶機制; 多晶矽; Excimer laser annealing; Real-time optical measurements; Amorphous silicon thin films; Recrystallization mechanism; Polycrystalline silicon; |
語文 | 中文(Chinese) |