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題 名 | 以脈衝雷射蒸鍍YIG(Y[feb0]Fe忦O[feba])薄膜=Deposition of YIG (Y[feb0]Fe忦O[feba]) Thin Films by Pulsed Laser Deposition |
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作 者 | 蘇睦庭; 陳建甫; 江文中; | 書刊名 | 華岡理科學報 |
卷 期 | 19 2002.05[民91.05] |
頁 次 | 頁31-40 |
分類號 | 440.34 |
關鍵詞 | 脈衝雷射蒸鍍; ArF準分子雷射; 靶材; X-光繞射分析; YIG; GGG; Pulsed laser deposition; PLD; ArF excimer laser; Target; X-ray diffraction analysis; |
語 文 | 中文(Chinese) |
中文摘要 | YIG (Y3Fe5O12)為磁光元件與磁記憶等科技之重要材料,其中尤以薄膜型式應用最為廣泛。YIG薄膜常以脈衝雷射蒸鍍(pulsed laser deposition,簡稱PLD)方式製備。本文詳述以脈衝雷射蒸鍍法成長YIG薄膜於GGG(Gd3Ga5O12)(111)與GGG(110)基板的完整過程,其中包括PLD系統簡介、實驗方法與步驟、以及樣品分析等;而鍍製於基板上之薄膜,經X-光繞射分析後,確認其為YIG(111)及YIG(110)。 |
英文摘要 | YIG (Y3Fe5O12) is a garnet material with broad applications in magneto-optical and memory devise, and the applications are mostly in the form of thin films. YIG thin films are often prepared by the technique of Pulsed Laser Deposition (PLD). This paper describes the detailed procedure of depositing YIG thin films onto GGG(Gd3Ga5O12)(111) and GGG(110) substrates by PLD. The content consists of PLD system description, experimental procedures, and sample analysis. X-ray diffraction analysis confirms that the final products on GGG(111) and GGG(110) are YIG(111) and YIG(110) thin films, respectively. |
本系統中英文摘要資訊取自各篇刊載內容。