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- Electrodeposition of Aluminium from the Molten Aluminium Chlioride-sodium Chloride Electrolytes by Direct Current and Pulse Current
- Fabrication of Platinum Coated Titanium Electrodes from Molten Salt Electrolytes by the Electrodeposition Process
- The Electrodeposition of Tungsten in the Low Melting Molten Carbamide Electrolyte
- 無電解鍍銅技術發展
- 無電解鍍銅技術發展
- Electrodeposition of Aluminum in the High Temperature Aluminum Chloride Molten Salt System
- 銅鎳的無電解電鍍
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題名 | Electrodeposition of Aluminium from the Molten Aluminium Chlioride-sodium Chloride Electrolytes by Direct Current and Pulse Current=熔融氯化鋁-氯化鈉電解質浴直流及脈衝電解鍍鋁技術 |
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作者 | 楊肇政; 張錦泉; | 書刊名 | 科技學刊 |
卷期 | 6:4 1997.10[民86.10] |
頁次 | 頁445-455 |
分類號 | 472.16 |
關鍵詞 | 電解電鍍; 熔融二元系電解質; 脈衝電流技術; Electrodeposition; Molten binary electrolytes; Pulse current technique; |
語文 | 英文(English) |
中文摘要 | 本研究係以二元系熔融Aidl�陛A-NaCI為電解質,利用直流及脈衝技術進行金屬基 材表面鋁電解電鍍。鋁鍍層性質依電流型式、電流密度、電解質組成及操作溫度之不同而異 。鋁鍍層之結構特性利用 X- 線繞射分析法及掃瞄式電子顯微鏡表面分析技術加以鑑測。依 研究結果顯示,使用脈衝電流技術可獲得較佳附著性,粒徑分布性且表面均勻之鋁鍍層。另 外,隨著 AICI �倏@度之增加,可獲得更佳緻密性,附著性及均勻性之鋁鍍層。 |
英文摘要 | The electrodeposition of aluminium from the molten binary AlC��-NaCl electrolytes using direct current (DC)and pulse current techniqueswas studied. The properties of the aluminium deposited layers varied withthe current forms, the current density, the composition of electrolytes, andthe operation temperature. The structural characteristics of the aluminium deposits layer wereexamined by Scanning electron microscopy and X-ray diffraction method.It revealed that the better coherence, grain size distribution and homogeneity of aluminium deposits layer can be obtained by the pulse current(PC) technique. In addition, by increasing the concentration of AlCI �� a denser, more coherent and uniform aluminium deposited layer was obtained. |
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