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題 名 | 鎳鈦形狀記憶合金之薄膜製程及形狀記憶特性研究 |
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作 者 | 胡知愛; 劉益銘; 楊智富; 姚永德; | 書刊名 | 材料科學 |
卷 期 | 25:2 1993.06[民82.06] |
頁 次 | 頁134-137 |
分類號 | 440.39 |
關鍵詞 | 合金; 薄膜; 鎳; 鈦; |
語 文 | 中文(Chinese) |
中文摘要 | 本實驗採磁控濺鍍法,將鎳鈦合金鍍於矽晶片上,藉著改變濺鍍時間, 氣體壓力、輸出功率及退火時間等濺鍍條件,觀察濺鍍膜之成長速率、組成、結 晶性,以獲得其有較佳記憶特性之薄膜。研究結果顯示,濺鍍時基板不加溫,所 得到之薄膜為非結晶構造,需經退火後才能得到晶體結構。由四點探針法,得知 在熱循環過程中電阻之變化,由X光繞射分析其結晶,並利用EDS分析鍍膜之組 成。 |
英文摘要 | The sputtering deposition process of NiTi alloy thin films via a r.f. magnetron splitter were studied, The as-deposited films were vacuum annealed to give the shape memory properties. Effects of sputtering power, Ar pressure and annealing temperature and time on the growth rate and properties of NiTithin film were evaluated. The crystal structure transitions of the annealed alloy were studied using a X-ray diffractometer. The transformation characteristics of the NiTi alloy thin film were examined usingconventional 4-probe electrical resistance measurements. Compositions of the coated film were analyzedusing EDS. Results show that the forward power of sputter and the Ar pressure affect significantly the Ti to Ni ratio as well as the growth rate of the NiTi thin film. |
本系統中英文摘要資訊取自各篇刊載內容。