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| 題 名 | 多功能式極紫外光微影元件檢測服務平臺=Multi-functional Extreme Ultraviolet Lithography Component Inspection Platform |
|---|---|
| 作 者 | 卓文浩; 吳品鈞; 李建霖; 黃羿誌; 李昭德; 蔡坤諭; 李佳翰; | 書刊名 | 科儀新知 |
| 卷 期 | 240 2024.09[民113.09] |
| 頁 次 | 頁45-56 |
| 專 輯 | 「EUV關鍵元件與技術」專題 |
| 分類號 | 448.65 |
| 關鍵詞 | 極紫外光; 半導體製程; 多功能式極紫外光微影元件檢測服務平臺; |
| 語 文 | 中文(Chinese) |
| 中文摘要 | 先進半導體製程已由 193 nm ArF 光源邁入 13.5 nm 極紫外光 (EUV) 時代,伴隨而來的 是光學系統、光罩材料、光阻等全面革新。為因應此一技術轉型,本團隊建置了「多功能式 極紫外光微影元件檢測服務平台」,提供光罩、光阻、反射鏡等關鍵元件的檢測服務。藉由 極紫外光檢測技術之開發,以協助國內半導體產業克服 EUV 製程中材料與製程挑戰,加速 先進製程技術開發。 |
| 英文摘要 | Advanced semiconductor manufacturing has transitioned from the 193 nm ArF light source to the 13.5 nm extreme ultraviolet (EUV) era, which has been accompanied by comprehensive changes in optical systems, mask materials, photoresists. In response to this technological transformation, our team has established an extreme ultraviolet lithography component inspection platform to provide inspection services for key components such as masks, resists, and mirrors. Through the development of extreme ultraviolet inspection technologies, we aim to assist the domestic semiconductor industry in overcoming material and process challenges in EUV manufacturing, accelerating the development of advanced process technologies. |
本系統中英文摘要資訊取自各篇刊載內容。