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| 題 名 | 極紫外光的感測與成像:螢光奈米鑽石的新應用=Sensing and Imaging of Extreme Ultraviolet Radiations: A New Application of Fluorescent Nanodiamonds |
|---|---|
| 作 者 | 吳沛婕; 張煥正; 楊騰毅; | 書刊名 | 科儀新知 |
| 卷 期 | 240 2024.09[民113.09] |
| 頁 次 | 頁35-44 |
| 專 輯 | 「EUV關鍵元件與技術」專題 |
| 分類號 | 448.65 |
| 關鍵詞 | 極紫外光; 半導體製程; 螢光奈米鑽石; |
| 語 文 | 中文(Chinese) |
| 中文摘要 | 當今半導體業有賴摩爾定律來提升電晶體的性能,為了實現此一目標,極紫外 (EUV) 光刻是一項關鍵技術。EUV 輻射的波長短,介於10121 nm 之間,製造商因此能夠在晶片 上繪製奈米尺寸的電路圖案,推動半導體技術的革新,並確保摩爾定律的延續。隨著各種 EUV 輻射光源的產生,EUV 光束線的診斷變得至關重要,也成為熱門議題。本文探討了一 項創新的 EUV 檢測器,使用螢光奈米鑽石 (FND) 薄膜作為閃爍體,將 EUV 光轉換為可見 光,獲取影像。此裝置不易被高能量輻射損壞,非常適用於光束品質的評估和空間位置的監 測,能夠提供全方位的資料以進行深入分析,並具備廣泛的應用潛力。 |
| 英文摘要 | The semiconductor industry relies on Moore's Law to drive the advancement of transistor performance. Extreme ultraviolet (EUV) lithography is a key technology in achieving this goal. EUV radiations have short wavelengths (10121 nm), allowing manufacturers to etch nanoscale circuit patterns on chips, thus advancing semiconductor technology and ensuring the continued relevance of Moore's Law. With the availability of various types of EUV light sources, beam diagnostics of the radiations has become critical, rendering the detector a crucial component. This article discusses an innovative EUV sensing and imaging device that uses uorescent nanodiamond (FND) films as a scintillator to convert EUV light into visible light and produce images. The diamond-based scintillator is not damaged by high-energy radiations and is useful for assessing beam quality and monitoring its spatial positions, providing comprehensive information for in- depth analysis and wide-range applications. |
本系統中英文摘要資訊取自各篇刊載內容。