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題名 | 微量氨氣去除技術=Removal of Trace Ammonia by Ionic Liquid |
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作者 | 徐芷涵; 李偉智; 陳鈞振; 康育豪; | 書刊名 | 潔淨科技 |
卷期 | 51 2024.02[民113.02] |
頁次 | 頁16-19 |
分類號 | 445.92 |
關鍵詞 | 氨氣; 離子液體; 半導體廠; Ammonia; Ionic liquid; Semiconductor; |
語文 | 中文(Chinese) |
中文摘要 | 氨氣(NH3 )為半導體製程一重要氣體,已成為半導體廠空污排放第二大宗、衍生性 PM 2.5 的前驅物之一。2025 年 將公布半導體空污排放標準加嚴法規草案,對 NH 3 進行加嚴管制,排放濃度需從現行的 2.5 ppm 降至 0.8 ppm。 半導體廠現行洗滌技術僅能調整回收水之 pH 值及提高換水量來達標,但 NH 3 排氣濃度仍>1 ppm,造成用水能 耗遽增且仍無法達標的問題。本研究目標為開發可除氨之離子液體,發展高效低濃度 NH 3 吸收去除技術。結果 顯示以兩款離子液體(IL-1 及 IL-5)之效能表現為佳,吸收效能皆能大幅優於水,離子液體透過分子結構設計增加 極性官能基,提升材料與氨氣間作用力及溶解度。IL-1 進行 NH 3 吸收效能測試後,吸收液液面會上升,顯示其 強吸水能力,同時具備除濕及除氨之雙重功用;而以相同濃度(20%)下測試離子液體吸收效能,IL-5 對 NH 3 具有 強吸收力,可維持 NH 3 出口端濃度 0 ppm 達 351 分鐘以上。 |
英文摘要 | Ammonia (NH3) , a critical process gas in semiconductor production, is the second largest air pollution from semiconductor factories, and is also one of PM2.5 precursor. NH 3 emission standard will be regulated more strictly from current 2.5 ppm to 0.8 ppm as revealed by the 2025 semiconductor air pollution standard draft. NH 3 emission concentration was present controlled using wet scrubber to achieve the regulations by adjusting pH value and increasing water-recycling rate. However, it increased water usage with NH 3 exhaust concentration still above emission standards (1 ppm) . The purpose of this project was developing ionic liquid which have high absorption ability to remove low NH 3 concentration. Results shows that IL-1 and IL-5 were both good for NH 3 absorption, which the absorption capacity were greater than water. Among them, the liquid level of IL-1 will increase after the NH 3 absorption test, which indicates that it has good water absorption capacity. It has the dual functions of dehumidification and ammonia removal. Furthermore, IL-5 has the best NH 3 absorption ability which compared at same concentration can maintain the NH 3 outlet concentration at 0 ppm for more than 351 minutes. |
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