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題名 | 應用霍式紅外光譜法調查半導體廠製程危害性氣體=Investigation of Semiconductor Work Place Airborne Chemicals by Fourier Transform Infrared Spectroscopy |
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作者 | 葉銘鵬; 吳榮泰; 余榮彬; | 書刊名 | 勞工安全衛生研究季刊 |
卷期 | 7:4 1999.12[民88.12] |
頁次 | 頁389-400 |
分類號 | 412.53 |
關鍵詞 | 霍氏紅外光譜儀; 半導體廠; 氣體分析; TIR; Semiconductor; Gas analysis; |
語文 | 中文(Chinese) |
中文摘要 | 了解半導體廠有害物之濃度和來源,可作為即時監控改善及安全衛生防護工作之 參考。開放光徑和密閉腔式霍氏紅外光譜儀可即時有效監測半導體廠酸性氣體、全氟碳氫化 合物(PFC )及有害有機溶劑蒸氣。清淨室內主要污染物為異丙醇及丙酮。主要可能來自於 擦拭及機台保養維修,而金屬蝕刻機台進行預防保養時,於刮除蓋上粉末及去離子水擦拭機 台內壁時HCN濃度較高。另低壓氮化矽機台測得高濃度之NH ,需特別注意處理問題以 免污染作業環境或發生白煙現象;矽化鎢機台尾氣管線測得矽甲烷,由於具自燃爆炸之危險 性,管線累積及處理需特別注意其安全性。此外乾式洗滌塔(EDWARDS GRC Model DI50) 之量測結果,對金屬蝕刻機台所排放HCI、BCl 及CCl 之處理效率可達99%,然對CF 尚 無處理效果。 |
英文摘要 | Identification and quantification of hazardous chemicals are essential for protecting the work place environment of semiconductor wafer fabrication factories. An open-path fourier transform infrared spectrometer (FTIR) and a close-cell FTIR were utilized to investigate the airborne acids, organics and perfluorinated compounds (PFCs). Isopropanol and acetone, common rinse solvents for tool maintenance and surface cleaning of equipment and work benches, were found as the major airborne contaminants in clean rooms. During preventive maintenance of metal etchers, hydrogen cyanide was out-gasing from the processes of chamber-wall-deposition scrubbing and DI water wiping. High concentration of ammonium was found in the exhaust effluents of low pressure nitride CVD tools. The ammonium will create higher opacity smoke, emitted from house scrubber, if mixed with acid exhaust in the main duct. Exhaust of tungsten silicide CVD was also consisted of loss amount of explosive silane. The treatment efficiency of Edwards GRC model DI50 dry scrubber was 99% for HCI, BCl and CCl of metal etcher exhausts while its treatment efficiency for CF was nearly zero according to this study. |
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