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題名 | 摻雜氮之二氧化鈦(N-TiO₂)光觸媒之製備及其可見光催化活性探討=Preparation and Photocatalytic Activity of Visible-light Photocatalyst--Nitrogen Doped Titanium Oxide(N-TiO₂) |
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作者 | 楊天賜; Yang, Tien-syh; |
期刊 | 慈濟技術學院學報 |
出版日期 | 20100500 |
卷期 | 15 2010.05[民99.05] |
頁次 | 頁105-118 |
分類號 | 468.8 |
語文 | chi |
關鍵詞 | 二氧化鈦; 可見光光觸媒; 反應式磁控濺鍍; 薄膜; Titanium oxide; Visible-light photocatalyst; Reactive magnetron sputtering; Film; |
中文摘要 | 利用反應式磁控濺鍍(Reactive magnetron sputtering)系統,通入氧氣(O2)、氬氣 (Ar)及氮氣(N2)來製備二氧化鈦(TiO2)薄膜及氮摻雜二氧化鈦(N-TiO2)薄膜。 得到之TiO2 薄膜具有銳鈦礦結晶結構,其能隙帶造成之光吸收陡升棱(Absorption edge) 在波長350 nm 附近,即在紫外光區吸收很大,而N-TiO2 薄膜之銳鈦礦結晶結構較不完 整,因氮的添加造成光吸收陡升棱偏移至400 nm 可見光區。從可見光照射後所引發的 亞甲基藍分解反應及水接觸角變化,來比較TiO2 及N-TiO2 薄膜的可見光催化活性,得 到N-TiO2的光催化亞甲基藍分解反應之一級反應速率常數為0.0435 h-1,而TiO2為0.0065 h-1;N-TiO2 的水接觸角在可見光照射下變小,而TiO2 幾乎沒有變化。即N-TiO2 薄膜在 兩種反應變化上皆具有較高的活性,而TiO2 薄膜的活性很小,幾乎沒有活性。本研究成 功地利用反應式磁控濺鍍系統製備出可見光光觸媒—摻雜氮之二氧化鈦(N-TiO2)薄膜。 |
英文摘要 | Both TiO2 and N-TiO2 films were prepared by a reactive magnetron sputtering of titanium target in gas mixture of argon, oxygen and nitrogen. The TiO2 film exhibits well-crystallized anatase phase. In contrast, the N-TiO2 film maintain primary anatase phase with decreasing crystallinity. The UV-Visible absorption spectra show the absorption edge of the N-TiO2 film is red-shifted to visible-light 400 nm from UV-light 350 nm of the TiO2 film. The visible light-induced photodegradation of methylene blue test indicates that the N-TiO2 film has an apparently higher activity with first-order rate constant 0.0435 h-1, compared with 0.0065 h-1 of the TiO2 film. The surface of the N-TiO2 film becomes superhydrophilic under visible-light illumination, characterized by a small water contact angle. However, the TiO2 film has scarcely variation of water contact angle. In this research, we prepared successfully the visible-light photocatalyst N-TiO2 film with apparently higher photocatalytic activity. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。