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題名 | 應用於微晶矽薄膜製程中化學活性物種濃度即時回授控制研究=Real-Time Feedback Control of Radical Species in a VHF Plasma for μ-Si Thin Film Deposition |
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作者 | 黃振榮; 張家豪; |
期刊 | 機械工業 |
出版日期 | 20090500 |
卷期 | 314 2009.05[民98.05] |
頁次 | 頁81-87 |
分類號 | 448.167 |
語文 | chi |
關鍵詞 | 電漿輔助化學氣相沉積; 製程飄移; 電漿放射光譜; 回授控制; Plasma enhanced chemical vapor deposition; PECVD; Process drift; Optical emission spectroscopy; OES; Feedback control; |