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題 名 | 不同真空度與試片位置對TiCrN鍍膜之機械性質探討=An Investigation of Different Vacuum Value and Specimen Position on Mechanical Properties of TiCrN Films |
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作 者 | 蕭惟隆; 林忠民; | 書刊名 | 正修學報 |
卷 期 | 22 2009.11[民98.11] |
頁 次 | 頁101-117 |
分類號 | 472.16 |
關鍵詞 | 陰極電弧電漿法; 靶材; 氮化鈦鉻薄膜; 機械性質; Cathodic arc plasma deposition; Target material; TiCrN coating; Mechanical property; |
語 文 | 中文(Chinese) |
中文摘要 | 本文利用陰極電弧電漿法以鈦及鉻爲靶材,高速鋼爲基材,於基材上被覆氮化鈦鉻(TiCrN)鍍膜,且在各種的實驗參數下探討不同真空度與試片位置對薄膜的結構及機械性質之影響。實驗結果顯示當真空度爲2×10^(-3)torr時,編號B6試片膜厚6.26μm爲最高,在真空度爲5×10^(-5)torr時,編號C3試片膜厚1.5μm爲最低,真空度爲5×^(-5)torr時,編號C4(wt.%: Ti60.48, Cr16.59, N22.93)試片的表面粗糙度最低,真空度爲2×10^(-3)torr 時,編號B2 試片的表面粗糙度爲最高,真空度爲1×10^(-2)torr時編號A4 (wt.%: Ti 33.14, Cr 30.96, N 35.90)試片之Ti、Cr、N元素比例接近1:1:1,可得到最佳硬度,編號A4試片附著力最佳,而編號A1及C1試片附著力不佳。 |
英文摘要 | In this study, the cathodic arc plasma system with Ti and Cr target material is used to deposit CrN, TiN and TiCrN coating on the high-speed steel substrate and to investigate the effects of different vacuum value and specimen position on the surface structure and mechanical properties of coating film. Experimental results are shown as follows: Sample of B6 has film thickness of 6.26 μm at vacuum value of 2×10^(-3) torr and sample of C3 has film thickness of 1.5 μm at vacuum value of 5×10^(-5) torr. Sample of C4 (wt.%: Ti 60.48, Cr 16.59, N 22.93) has lowest surface roughness at vacuum value of 2×10^(-3) and sample of B2 has highest surface roughness; sample of A4 (wt.%: Ti 33.14, Cr 30.96, N 35.90) have highest film hardness at vacuum value of 1×10^(-2) torr; sample of A4 has highest adhesion strength and sample of A1, C1 has lower adhesion strength. |
本系統中英文摘要資訊取自各篇刊載內容。