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題 名 | 氫氧基磷灰石/鈦磁控濺鍍膜微結構及性質研究=Microstructure and Properties of Magnetron-Sputtered Hydroxyapatite/Titanium Coatings |
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作 者 | 丁信智; 朱建平; 陳瑾惠; | 書刊名 | 中華醫學工程學刊 |
卷 期 | 19:1 1999.03[民88.03] |
頁 次 | 頁59-66 |
分類號 | 472.16 |
關鍵詞 | 氫氧基磷灰石; 鈦; 磁控濺鍍; 微結構; 附著強度; Hydroxyapatite; Titanium; Sputtering; Microstructure; Adhesion strength; |
語 文 | 中文(Chinese) |
中文摘要 | 本研究利用射頻磁控濺鍍技術(RF magnetron sputter)在鈦合金基材上濺鍍單層 HA/Ti薄膜,分析鍍膜附著強度,微結構及化學組成。實驗結果發現在靶材/鍍膜中具高 Ti 含量時造成較高披覆速率,SEM-EDS 顯示純 HA 濺鍍前後 Ca/P 比相同。 當鍍膜中含少 量 Ti 時,HA 鍍膜之高結晶性結構即遭嚴重破壞而產生近非晶質結構鍍膜。高結晶性之 Ti 結構也因少量 HA 加入靶材後,產生明顯變化。一般 HA/Ti 鍍膜厚度均勻、緻密、平且與 基材鍵結良好,所有鍍膜附著強度皆在60-80MPa之間。 |
英文摘要 | A series of thin (<10um), single-layered HA/Ti coatings were deposited on Ti-6AI-4V substrate using a RF magnetron-assisted sputtering system. Adhesion strength, microstructure and chemistry of the coatings were characterized. Experimental results showed lhat higher Ti contents in targets/coatings resulted in higher deposition rates. When Ti was added, the highly crystalline structure of monolithic HA coating was largely disrupted and the coating became amorphous-like. The highly crystalline structure of monolithic Ti coating was also disrupted by introducing small amounts of Ca, P and 0 into the coating. The HA/Ti coatings had quite uniform thicknesses and appeared smooth, dense and well bonded to the substrate. SEM-EDS showed that the Ca/P ratio of HA target was largely retained after sputtering. Adhesion strengths of all coatings were between 60 and 80 MPa. |
本系統中英文摘要資訊取自各篇刊載內容。