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題名 | PVD設備系統整合=Integrated PVD Equipment |
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作者 | 張凱傑; | 書刊名 | 金屬工業 |
卷期 | 34:2 民89.03-04 |
頁次 | 頁45-50 |
專輯 | 設備及自動化專輯 |
分類號 | 472 |
關鍵詞 | 磁控濺射; 氣流通量; 質量流量控制系統; 磁性流體軸承; 基板; Magnetron sputtering; Throughput; Mass flow controller; Ferrofluid bearing; Substrate; |
語文 | 中文(Chinese) |
中文摘要 | PVD設備為半導體、平面顯示器、工具五金、光學元件等產品之基本設備。近來在機械鍍膜方面為提昇切削刀具、機械零件及模具的使用壽命,使得金屬表面改質技術不斷的精進;由於真空鍍膜技術及電漿技術的進步,在提升材料表面機械性質方面,更能達到耐磨、耐腐蝕、美觀及延長使用壽命的要求。由於PVD設備種類繁多,本文將著重在介紹磁控濺射鍍膜系統所需考慮的零組件及應注意事項,做一整體性的敘述。 |
英文摘要 | Physical Vapor Deposition (PVD) equipment is the fundamental device in the production of semiconductor, monitor display, tools and optical components. Recently PVD has increasingly improved surface treatment technology applied in metal material and thus has extended life cycle in cutting tool, machinery parts and molds & dies. The progress of PVD and plasma technology enable improvement in the properties of wear-resistance, erosion resistance and beautifying appearance as well as tool life extension. Since many different types of PVD equipment have been developed, yet this article is focused on overall description on the required components and key points in magnetron sputtering system. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。