頁籤選單縮合
題 名 | Deep X-ray Lithography Developed at SRRC=同步輻射研究中心所發展之X光深刻術 |
---|---|
作 者 | 程曜 ; 許博淵; 林經堯; 魏德新; | 書刊名 | Proceedings of the National Science Council : Part A, Physical Science and Engineering |
卷 期 | 23:4 1999.07[民88.07] |
頁 次 | 頁537-543 |
分類號 | 449.65 |
關鍵詞 | 同步輻射研究中心; X光深刻術; Synchrotron radiation; Deep x-ray lithography; LIGA process; Micromachining; MEMS; Thick film; Hight aspect ratio; Microstructure; |
語 文 | 英文(English) |
英文摘要 | This paper reports the recent development breakthrough and chievement of special deep x-ray lithography at the Synchrotron Radiation Research Center (SRRC). The features of the ultra-deep LIGA (Lithography, Gavanoformung, and Abformung) process developed at SRRC are introduced and compared with those of conventional LIGA technology. This article covers the setup of key elements required for the deep x-ray lithography process at SRRC. This includes the Taiwan light source (TLS), beamline, exposure system, x-ray mask, photoresist, substrate and exposure doses. After three years of development, deep x-ray lithography at SRRC has now become far more mature and reliable. It now has real value for basic research and industrial application. |
本系統中英文摘要資訊取自各篇刊載內容。