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題 名 | 化學計量比對真空蒸鍍聚亞醯胺薄膜結構之影響=Stoichiometric Ratio Effect on the Film Structure of Vapor Deposition Polyimide |
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作 者 | 程謙禮; 周卓煇; 翁文國; | 書刊名 | 材料科學 |
卷 期 | 30:1 1998.03[民87.03] |
頁 次 | 頁13-20 |
分類號 | 472.16 |
關鍵詞 | 真空蒸鍍聚合; 共蒸鍍; 聚亞醯胺; 化學計量比; 薄膜結構; Vapor deposition polymerization; Co-evaporation; Polyimide; Stoichiometric ratio; Film structure; |
語 文 | 中文(Chinese) |
中文摘要 | 本研究探討化學計量比(Stoichiometric Ratio)對真空蒸鍍聚合(Vapor Depostion polymerization)聚亞醯胺(Polyimide, PI)薄膜結構之影響。研究中使用均苯二酸酐(Pyromellitic Dianhydride,PMDA)及4-4'二胺基二苯醚(4-4' Oxydianiline, ODA)為單體,以不同的化學 計量比在真空狀態下蒸鍍聚合成聚醯胺酸(Polyamic Acid, PAA),再加熱成聚亞醯胺。所得 薄膜再用霍式轉換紅外光(Fourier Transform Intrared, FT-IR)光譜儀、熱重差法分析 (Thermogravimetrical Analysis, TGA)及光學顯微鏡,來觀察結構。結果發現,無論化學計 量比如何,皆有未反應的單體存在於薄膜內;其中,單體化學計量比為1時,未反應單體的 含量最少。但是,在任一單體過量的情況下,則產生較佳的聚醯胺酸產出。經200℃、30分 鐘加熱,部份的聚醯胺酸轉換成聚亞醯胺;同時,積存在薄膜內的單體,因蒸發而減少或消 失。在微觀組織上發現,過多的單體積存,致使薄膜呈現相分離(Phase Separation)或結晶 (Crystallization)的現象。 |
英文摘要 | The effect of varying stoichiometric ratio on the film structure of vapor deposition polymerization (VDP) polyimide (PI) was studied. The monomers used were pyromellitic dianhydride (PMDA) and 4,4'-oxydianiline (ODA). Different stoichiometric ratios were employed during the formation of polyamic acid (PAA), which was then heated to convert to the PI counterpart. The resultant film structures were investigated using Fourier Transform Infrared (FT-IR), thermogravimetrical analysis (TGA), and optical microscopy. Unreacted monomers were found throughout the resultant films. The unreacted amount was the least when the ratio was close to 1. However, higher yield of polyamic acid was obtained when either monomer was excess. Upon curing at 200℃ for 30 min, part of the polyamic acids were converted to the PI counterparts. Whilst, the residual monomers were significantly reduced or diminished due to vaporization. Phase separation or crystallization was observed when excess amount of the unreacted monomers existed in the films. |
本系統中英文摘要資訊取自各篇刊載內容。