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| 題 名 | 紫外超穎介面於前瞻光譜與奈米製造之應用=Ultraviolet Metasurfaces for Advanced Molecular Spectroscopy and Nanofabrication |
|---|---|
| 作 者 | 沈上傑; 曾銘綸; | 書刊名 | 科儀新知 |
| 卷 期 | 245 2025.12[民114.12] |
| 頁 次 | 頁43-53 |
| 專 輯 | 「光學超穎材料/超穎介面及其應用」專題 |
| 分類號 | 448.68 |
| 關鍵詞 | 超穎介面; 超穎材料; 深紫外光; 光學; |
| 語 文 | 中文(Chinese) |
| 中文摘要 | 超穎介面為次波長奈米結構組成之二維光學裝置,近年應用拓展至深紫外波段。深紫外光具高能量與短波長,廣泛應用於生醫光譜、材料分析、微影製程與超快雷射。本文探討深紫外超穎介面於光譜與奈米製造之應用,說明其在分子吸收與拉曼散射中的優勢,並介紹近年以鋁與矽材料實現深紫外共振拉曼增強之成果,及基於氮化鋁之超穎透鏡於成像與微加工中的應用。深紫外超穎介面具微型化、高靈敏與可整合等優勢,展現新世代光電元件潛力。 |
| 英文摘要 | Metasurfaces, composed of subwavelength nanostructures, have expanded into the deep-ultraviolet (DUV, 200-300 nm) regime, offering new opportunities in biomedical spectroscopy, materials analysis, lithography, and ultrafast lasers. However, conventional optics face challenges in DUV due to strong material absorption and high fabrication costs. This article reviews the potential of DUV metasurfaces in spectroscopy and nanomanufacturing, highlighting their advantages in molecular absorption and resonant Raman scattering. We present recent demonstrations of aluminum plasmonic and silicon polaritonic metasurfaces that enhance DUV Raman signals, as well as aluminum nitride metalenses for DUV imaging and picosecond laser microfabrication. These advances highlight the potential of metasurfaces to enable compact, sensitive, and integrable DUV photonic devices. |
本系統中英文摘要資訊取自各篇刊載內容。