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題 名 | 全場外差干涉術的原理與其相關之應用=The Principle of the Full-field Heterodyne Interferometry and its Applications |
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作 者 | 張巍耀; 陳彥良; 謝鴻志; 李朱育; 蘇德欽; | 書刊名 | 光學工程 |
卷 期 | 120 2012.12[民101.12] |
頁 次 | 頁64-69 |
分類號 | 336.9 |
關鍵詞 | 外差干涉術; 弦波擬合法; 絕對相位; 全場折射率; Heterodyne interferometry; Sine-fitting algorithm; Absolute phase; Full-field refractive index; |
語 文 | 中文(Chinese) |
中文摘要 | 本文將介紹一種全場外差干涉術的量測技術。此技術主要是利用電壓振幅低於電光晶體半波電壓的鋸齒波來驅動電光晶體調制器,並產生一連串弦波信號的採樣點。接著,再使用最小平方弦波擬合法,來獲得全場的絕對相位之分佈;而此全場的絕對相位之分佈將與各種待測的物理量相關,因此可進行各項物理量的量測與分析,例如:折射率之分佈、表面形貌、粗糙度以及應力等。此技術除了具有傳統外差干涉術的高解析度、量測速度快、可避免背景光和光源穩定性影響等優點外,更可解決在全場外差干涉術中所遇到參考訊號取得的難題。 |
英文摘要 | This paper introduces a measurement technique of a full-field heterodyne interferometry. This technique uses a saw-tooth voltage signal with the amplitude lower the half-wave voltage to drive electro-optic modulator. Then, a series of sampling point of sinusoidal wave can be generated. Based on a least-squares sine fitting algorithm, the full-field absolute phase distribution can be obtained. This phase distribution is related to associated physical parameters. Hence, the associated physical parameters can be measured and analyzed, such as refraction index distribution, surface roughness, topography, and stress analysis. This technique has the advantages of traditional heterodyne interferometry, such as high resolution, rapid measurement, background disturbance reduction, light source stability. It also can resolve the difficulty of catching reference signal in the full-field heterodyne interferometry. |
本系統中英文摘要資訊取自各篇刊載內容。