查詢結果分析
相關文獻
- ALD設備與產業展望
- 原子層沉積技術之發展與應用
- 原子層沉積技術簡介
- 原子層化學氣相沈積(ALD)
- 原子層沉積系統設計與製作實務
- 陣列式電容耦合電漿輔助原子層沉積系統
- 奈米國家型計畫「ALD於氣體擴散層製備晶粒<2nm觸媒應用於高效能燃料電池」計畫執行簡介
- 原子層沉積技術及其應用
- 原子層沉積製程技術於能源材料之應用
- Object-Oriented Design Methodology and Implementation of an Optimizing Adaptive Quality Controller for Semiconductor Manufacturing Processes
頁籤選單縮合
題名 | ALD設備與產業展望=Industrial Applications and Development Prospect of Atomic Layer Deposition |
---|---|
作者姓名(中文) | 柯志忠; 卓文浩; 林建寶; 劉柏亨; 陳建宏; | 書刊名 | 科儀新知 |
卷期 | 35:2=196 2013.10[民102.10] |
頁次 | 頁71-80 |
分類號 | 448.552 |
關鍵詞 | 原子層沉積技術; 半導體製程; ALD; |
語文 | 中文(Chinese) |
中文摘要 | 自上世紀60年代發展以來,原子層沉積技術(atomic layer deposition, ALD)逐漸受到重視,尤其半導體製程微縮化需求促進ALD設備工業化以及本世紀初ALD設備產業蓬勃發展,由於ALD技術具由極佳沉積覆蓋性與厚度控制,許多現有半導體製程亦將轉換為ALD,因此在可見未來ALD製程技術與設備將在半導體領域具有重要角色。正當ALD在半導體產業方興未艾,能源、民生、觸媒與光電產業亦觀察到ALD應用可行性,因此ALD設備廠商根據產業製程需求,開發plasma-enhanced ALD、batch ALD、spatial ALD、roll-to-roll ALD與powder ALD等系統,並且達到工業量產之要求,顯示ALD設備仍有極大開發空間。 |
英文摘要 | Since the invention in 1960s, atomic layer deposition (ALD) has been attracted great attention. The miniaturization of semiconductor devices is another trigger of equipment development and commercialization of ALD by the end of last century. ALD is also considered as an enabling technique to replace conventional coating tool due to the requirements of coating conformity and thickness control in next generation devices. Therefore, ALD technique and equipment will play greater role in the semiconductor industry. On the contrary, ALD shows potential in non-semiconductor industries, such as energy, optoelectronics and catalysis. Innovative ALD systems, such as plasma-enhanced ALD, batch ALD, spatial ALD, roll-to-roll ALD, powder ALD, were developed by the equipment suppliers on the basis of the industrial needs. The throughputs of ALD systems can match the requirement for industrial commercialization. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。