查詢結果分析
相關文獻
- A General Model for Predicting the Baking Behavior of a Polymer Film from Poly(vinyl acetate)/Methanol
- 替代燃料對汽柴油引擎性能、毒性、污染與噪音特性分析之研究
- Boiling Stability Characteristics of Porous Surface
- 桑葉甲醇萃取物抗氧化機制之探討
- 光阻曝光後延遲烘烤對線寬影響之分析與討論
- 鹼性無硫製漿中蒽醌在界面活性劑內之作用
- Methanol Sensors Based on Conductive Polymer Composites from Polypyrrole and Poly (Ethylene Oxide)--Sensing Properties(Ⅰ)
- Voltammetric Investigation of Nickel-Platinum Codeposits for Methanol Oxidation in KOH Solutions
- Influence of Secondary Metal Oxide Additives on Molecular Structure and Reactivity of V[feaf]O邚/SnO[feaf]/SiO[feaf] Catalysts during Methanol Oxidation
- 矽膠接技功能高分子膜之應用
頁籤選單縮合
題名 | A General Model for Predicting the Baking Behavior of a Polymer Film from Poly(vinyl acetate)/Methanol=以聚醋酸乙烯酯/甲醇系統建立高分子薄膜烘烤行為之通用理論模型 |
---|---|
作者姓名(中文) | 林威戎; 劉振良; 陳文章; | 書刊名 | Journal of the Chinese Institute of Chemical Engineers |
卷期 | 34:4 2003.07[民92.07] |
頁次 | 頁471-479 |
分類號 | 467 |
關鍵詞 | 聚醋酸乙烯酯; 甲醇; 高分子薄膜; 烘烤; Baking; Polymer film; Diffusion; Mass transfer; |
語文 | 英文(English) |
中文摘要 | 高分子薄膜的烘烤為控制結構及性質之重要步驟,其中又以擴散常數及質傳常數為研究烘烤機制最重要的兩個參數,本研究提出一種通用理論模型以分析研究各種烘烤參數對高分子薄膜的影響。過去文獻之質傳常數多為由實驗迴歸所得,而在本研究則建立一以邊界層理論為基礎之模型來預測質傳常數,其中擴散常數則是採用Vrentas-Duda方程式來表示。此模型的適用性由與聚醋酸乙烯酯/甲醇系統實驗結果的比較而確立。此外,本文亦詳細探討烘烤參數如質傳常數、擴散常數、烘烤溫度、薄膜表面乾燥氣體流速及烘烤時間等,對於膜厚及溶劑殘餘量之影響,由結果顯示隨著烘烤時間增長,烘烤機制由蒸發控制轉變為擴散控制,在不同乾燥氣體流速下,溶劑在薄膜內部的濃度分佈可藉由調整烘烤時間達成一致,因此乾燥氣體流速僅影響烘烤速率;相對的烘烤溫度則因同時影響擴散常數、質傳常數而同時影響烘烤速率及溶劑殘餘量,提高烘烤溫度甚至有效降低高分子薄膜常見之膚膜現象。 |
英文摘要 | Baking is very important for controlling the structure and properties of polymer thin films. The diffusion and mass transfer coefficients are two basic parameters for studying the baking mechanism. In this study, a general theoretical analysis of baking was developed to study the influence of various baking parameters on polymer film formation. In the literature, the mass transfer coefficient has generally been obtained from experimentally fitted data. In this study, a new model equation based on the boundary layer theory was developed to predict the mass transfer coefficient. The Vrentas-Duda equation was used to predict the variation of the diffusion coefficient with the concentration and baking temperature. The applicability of this model was justified by means of experimental data from solvent residue were analyzed, including the mass transfer coefficient, diffusion coefficient, drying air velocity, baking temperature, and baking time. It was found that the baking mechanism could be shifted from the evaporation control to the diffusion control by in creasing the baking time. The solvent distribution inside the film could be the same at different drying air velocities by applying different baking time, The baking temperature played a more significant role in the solvent residue content than the drying air velocity because it affected both the mass transfer coefficient and diffusion coefficient. The skinning phenomena could be largely reduced by increasing the baking temperature. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。