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頁籤選單縮合
題名 | Characterization of Poly(silsesquioxane) by Thermal Curing=由熱硬化製備Poly(silsesquioxane)的分析 |
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作者 | 楊昌中; 陳文章; 陳麗梅; 王朝仁; | 書刊名 | Proceedings of the National Science Council : Part A, Physical Science and Engineering |
卷期 | 25:6 2001.11[民90.11] |
頁次 | 頁339-343 |
分類號 | 460.02 |
關鍵詞 | 熱硬化製備; Poly; Poly(silsesquioxane); Curing; Cage; Network; Two-stage kinetics; |
語文 | 英文(English) |
中文摘要 | 本文乃研究三種poly(silsesquioxane):HSQ、MSQ及HOSP經由熱硬化處理之結構 與特性變化。經熱硬化處理之 poly(silsesquioxane) 部分籠狀結構會轉化為網狀結構。而 其網狀結構與籠狀結構之比例大小與折射率大小相同,此乃由於自由體積改變之緣故。研究 亦針對 MSQ 薄膜之熱硬化結構轉化動力學作探討。 研究發現可由兩階段零級反應動力方程 式解釋,而第一階段之反應常數遠大於第二階段之反應常數,這可能是由於網狀結構限制其 結構轉化之故。 |
英文摘要 | The structures and properties of three poly(silsesquioxane) (POSS) films were studied, including hydrogen silsesquioxane (HSQ) , methyl silsesquioxane (MSQ), and hybrido-organo siloxane polymer (HOSP). The cage structures of the POSS films were transformed into network structures by means of thermal curing. The order of the ratios of network/cage transformation after thermal curing was HSQ > MSQ > HOSP. This was the same as the order of the refractive indices of the studied POSS films because of the variation of the molar volume due to the network/cage ratio. The structural conversion of the MSQ film was studied at four different temperatures of 200, 250, 300, and 350 ℃ under a time range of 0 to 60 minutes. The experimental results show that the structural conversion could be explained based on two-stage zero order kinetics. The rate constant for the first stage was one or two orders of magnitude greater than that for the second stage. The activation energy and frequency factor of network/cage transformation were 0.38 eV and 1.21 × 10 �� s □ for the first stage while those for the second stage were 0.14 eV and 8.8 × 10 □ s □, respectively. The smaller frequency factor of the second stage compared to that of the first stage probably occurred because the network structure of the second stage limited the structural transformation. These results suggest that the structure and properties of the POSS film depend strongly on the conditions of thermal curing. |
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