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頁籤選單縮合
題名 | Study on Cross-resistance between BPU-type IGRs and Other Insecticides Including Bacillus Thuringiensis and Abamectin in the Diamondback Moth, Plutella Xylostella L.=小菜蛾對BPU類生長調節劑及其他殺蟲劑交互抗性之研究 |
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作者 | 高靜華; 鄭允; Kao, Ching-hua; Cheng, Edward Y.; |
期刊 | 中華農業研究 |
出版日期 | 19991200 |
卷期 | 48:4 1999.12[民88.12] |
頁次 | 頁84-95 |
分類號 | 433.3 |
語文 | eng |
關鍵詞 | 小菜蛾; BPU類生長調節劑; 殺蟲劑; 抗藥性; 交互抗性; Plutella xylostella; Cross-resistance; Benzoylphenyl urea; Insect growth regulator; Insecticides; |
中文摘要 | 本研究測試抗benzoylphenylurea (BPU)類生長調節劑之小菜蛾對有機磷劑、氨基甲酸鹽劑、合成除蟲菊精、BPU類生長調節劑、蘇力菌及阿巴汀是否具有交互抗性。結果顯示,以BPU類生長調節劑篩選之品系對加保扶有交互抗性。抗BPU類生長調節劑之小菜蛾品系對其他受測藥劑均不具交互抗性,且對蘇力菌及阿巴汀之感度仍極高。BPU類中不同的生長調節劑間則具交互抗性,惟程度不一,其中,hexaflumuron受交互抗性之影響最小,其次為chlorfluazuron,而flufenoxuron與teflubenzuron則有極嚴重之交互抗性。此一現象在田間抗BPU類生長調節劑之品系,及以單劑汰選出之抗性品系均相同。而於田間篩選抗性時,則以已在本省登記之chlorfluazuron及teflubenzuron較flufenoxuron 及hexaflumuron快速,可能與前兩項藥劑已在台灣使用有關。再由BPU類生長調節劑之化學結構,以及感、抗性品系之測試結果分析推測,BPU類生長調節劑phenyl-環上之3,5-dichloro-結構與位置4上之大型鍵結側基(moiety),可降低小菜蛾對BPU類生長調節劑之抗性程度。 |
英文摘要 | Investigation of cross-resistance of diamondback moth (DBM), Plutella xylostella L., which resisted to benzoylpheny1 urea (BPU)-type insect growth regulator (IGR), among four organophosphorus insecticides, two carbamates, two synthetic pyrethroids, four IGRs, Thuricide and Abamectin was conducted in this study. The IGR-selected strains did not show strong cross-resistance to test insecticides except carbofuran. A relatively high resistance to synthetic pyrethroids was recorded as synthetic pyrethroid resistance of the DBM is an existing phenomenon in Taiwan. All IGR-resistant strains were still highly sensitive to Thuricide and Abamectin. Cross-resistance among different IGRs is significant in different amplitudes. Hexaflumuron was the least affected by IGR cross-resistance and followed by chlorfluazuron while flufenoxuron and teflubenzuron confronted with the most serious cross-resistance problem. The IGR-resistancce in DBM is chemical structure-related. Analyses of structure-activity relationship in both susceptible and resistant strains indicated both 3, 5-dichloro- and a large side moiety at position-4 on the pheny1 ring of BPU are beneficial to reduce the IGR-resistance in DBM. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。