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題 名 | 半導體業空氣污染管制及排放標準訂定緣由=Development of Emission Standards of Air Pollutants for Semiconductor Industry |
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作 者 | 賴慶智; 林樹崧; | 書刊名 | 化工資訊月刊 |
卷 期 | 13:6 1999.06[民88.06] |
頁 次 | 頁40-44 |
分類號 | 555.58 |
關鍵詞 | 半導體業; 空氣污染管制; 排放標準; |
語 文 | 中文(Chinese) |
中文摘要 | 本文介紹“半導體製造業空氣染管制及排放標準”研訂過程中所採行之最大可達 控制技術(MACT)分析及殘餘風險評估,並討論該方法套用在我國半導體製造業時所得結果與 最終排放標準間之關連。研究結果顯示,半導體製業揮發性有機物空氣污染防制之MACT為濃 縮後焚化技術,可達之去除率為90%,可達之工廠總排放量為0.6kg/hr;無機酸空氣污染防 制之MACT為洗滌技術,可達之去除率為95%,可達之工廠總排放量各為□kg/hr。殘餘風險 評估之結果顯示,三氯乙烯及硫酸之工廠總排放量必須分別小於0.02kg/hr及0.1kg/hr,否 則最大落地濃度之增量將大於AALG。 尬W量將大於 AALG。 |
英文摘要 | Air pollution regulations for Taiwan's semiconductor industry, "Emission Standards of Air Pollutants for Semiconductor Manufacturing Industry", were promulgated on Jan. 6, 1999. This article introduces the approaches and development for drafting the regulation. The approaches are based on the Maximum Achievable Control Technology (MACT) guidelines and risk assessment of pollutant dispersion in the ambient air. According to our results, the MACT for volatile organic compounds (VOC) in Taiwan semiconductor industry is rotary concentration/incineration technology. Removal efficiency of VOC can exceed 90% and emission amount of VOC is lower than 0.6 kg/hr. For inorganic acid emissions, the MACT is wet scrubbing technology. Removal efficiencies of the acids can exceed 95% and emission amount lower than 0.6 kg/hr. The risk assessment of various air pollutants is obtained based on the geographical information and atmospheric dispersion models. According to out results, to reduce the maximal ambient air concentrations of the pollutants below the Ambient Air Level Goal (AALG), the total emission amounts of trichloroethylene (TCE) and sulfuric acid from each semiconductor facility should be below 0.02 kg/hr and 0.1 kg/hr, respectively. |
本系統中英文摘要資訊取自各篇刊載內容。