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題 名 | Isolation and Phytotoxic Effects of Helvolic Acid from Plant Pathogenic Fungus Sarocladium Oryzae=水稻葉鞘腐敗病菌之煙麴黴酸的分離和植物毒性 |
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作 者 | 陳昇明; 陳麗玲; 謝顯宗; 吳天賞; | 書刊名 | Botanical Bulletin of Academia Sinica |
卷 期 | 38:4 1997.10[民86.10] |
頁 次 | 頁251-256 |
分類號 | 373.9 |
關鍵詞 | 煙麴黴酸; 水稻葉鞘腐敗病菌; 植物毒性; 抗生素; 植物病原真菌; Antibiotic; Helvolic acid; Phytotoxic substance; Plant pathogenic fungus; Sarocladium oryzae; |
語 文 | 英文(English) |
中文摘要 | 吾人從水稻葉鞘腐敗病菌分離出一種抗生物質,煙麴黴酸。真菌以馬鈴薯蔗糖培 養液培養生產煙麴黴酸。以乙酸乙酯自培養基中萃取煙麴黴酸,並利用枯草桿菌測試抗生活 性。 煙麴黴酸可溶於氯仿、 丙酮、乙酸乙酯、甲醇、乙醇和鹼性水, 它在 22-100 ℃和 pH 3-11 藥性仍然保持穩定。煙麴黴酸是依據紫外線光譜儀、紅外線光譜儀、核磁共振儀和 質譜儀顯之吸收光譜而鑑定。煙麴黴酸的毒性在禾本科植物幼苗呈現矮化和黃化。這種毒性 現象經霍克蘭溶液和鎂離子溶液處理後,分別減輕症狀百分之四十和百分之三十。 |
英文摘要 | In this study, we isolate helvolic acid, an antibiotic metabolite, from the rice sheath rot pathogen Sarocladium oryzae. The fungus is cultured in potato-sucrose brot. The metabolite is extracted by ethyl acetate, and its antibiotic activity is tested with Bacillus subtilis. Helvolic acid is soluble in chloroform, acetone, ethyl acetate, methanol, ethanol, and alkali water. The substance is stable at an active temperature of 22 ℃ -100 ℃ and is also active at various hydrogen ion levels (pH 3-11). Also, helvolic acid is identified with thin-layer chromatography and further characterized by UV, IR, NMR, and Mass spectroscopy. The toxic effects of helvolic acid on seedlings of Graminae include growth retardation and chlorosis. These effects are reduced about 40% by treating with Hoagland's solution and can be reduced to around 30% by treating with magnesium solution. |
本系統中英文摘要資訊取自各篇刊載內容。