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頁籤選單縮合
題名 | 積體電路用光阻劑中微量二素的分析=Determining Trace Elements in Photoresists for Integrated Circuit Manufacturing--A Review |
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作者姓名(中文) | 林雨平; 蘇淑蘭; | 書刊名 | 化工資訊月刊 |
卷期 | 11:5 1997.05[民86.05] |
頁次 | 頁9-22 |
專輯 | 電子用化學材料 |
分類號 | 440.34 |
關鍵詞 | 積體電路; 光阻劑; 微量二素; |
語文 | 中文(Chinese) |
英文摘要 | This article reviews how trace elements, e.g. Na, K. Fe, Si, Cu, Pb, Mn, Cr or Ni, are determined in photoresist. This review includes using several procedures to pretreat photoresists, including (I) dilution by organic solvents, (II) acid decomposition, (III) TMAH digestion or (IV) water and solvent extraction. Three instrumental analyses, i.e. graphite furnace atomic absorption spectrome GFAAS, MIP-MS or ICP-MS, are also introduced to analyze of trace elements in treated samples. Previous literature discussed in this review provide further insight into the issue of contamination control involving photoresists. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。