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題 名 | Global Stiffness Matrix Formulation of V(z) Curve for a Thin-Layer/Substrate Configuration=以整體勁度矩陣理論模擬鍍薄膜試體之超聲波顯微鏡V(z)曲線之研究 |
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作 者 | 劉季宇; 郭茂坤; | 書刊名 | 力學 |
卷 期 | 12:3 1996.09[民85.09] |
頁 次 | 頁319-327 |
分類號 | 440.13 |
關鍵詞 | 超聲波顯微鏡; V(z)曲線; 勁度矩陣; AMS; V(z) curve; Stiffiness matrix formulation; |
語 文 | 英文(English) |
中文摘要 | 本文旨就任意層狀介質試體,建立一以整體勁度矩陣理論(global stiffness matrix formulation )為基礎之線聚焦式超聲波顯微鏡( line-focus acoustic microscope ) V(z) 曲線數值模擬方法。其主要依據是以波數域( wavenumber domain ) 中之局部勁度矩陣配合線性疊加原理,求解由顯微鏡鏡頭送出波場所引致之散射波場,再代 入一力-電互易關係( electromechanical reciprocity )而得。 算例包括由多晶矽及多 晶氧化鋅(假設為等向均質)所組成之鍍單層試體,在各種不同層厚下之 V(z) 曲線模擬。 根據各試體頻散關係( dispersion relations )所預測之試體受激發表面波,諸如漏失( leaky ) Rayleigh 或 Sezawa 或 pseudo-Sezawa 波, 其波速均可由 V(z) 曲線準確決定 出。 |
英文摘要 | A global stiffness matrix formulation for thin-layer/substrate configurations is proposed to simulate the V(z) curves of a line-focus acoustic microscope. In this formulation, the scattered wavefield, which results from a lens-focused incident wavefield in the coupling fluid upon a multilayered specimen, is solved in the wavenumber domain via the principle of linear superposition to synthesize the required global stiffness matrix. Accordingly, the reflection coefficients of arbitrary multi-layered media can be expressed in a systematic way. The electro-mechanical reciprocal relation is then used to evaluate the voltage output, or the so-called V(z) curve. Examples for the thin-layer/substrate configuration of polycrystalline ZnO and silicon, which are assumed isotropic and linearly elastic, are well investigated. The excited leaky surface waves, for example the leaky Rayleigh or leaky Sezawa or leaky pseudo-Sezawa waves with respect to various layer thicknesses, can be interpreted quantitatively from these V(z) curves. |
本系統中英文摘要資訊取自各篇刊載內容。