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題 名 | Preparation and Characterization of InTaO₄ Films by Rapid Thermal Annealing of In₂O₃/Ta₂O₅ Multilayered Films=利用快速退火複合多層In₂O₃/Ta₂O₅薄膜製備InTaO₄薄膜及其特性研究 |
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作 者 | 卓宥任; 劉上綸; 吳敘涵; 梁興正; 謝章興; | 書刊名 | 真空科技 |
卷 期 | 27:3 2014.09[民103.09] |
頁 次 | 頁63-69 |
分類號 | 468.8 |
關鍵詞 | 鉭銦氧化物; 光觸媒特性; 薄膜; 光吸收性質; InTaO₄; Photocatalytic properties; Thin films; Optical absorption; |
語 文 | 英文(English) |
中文摘要 | 本研究利用快速退火多層In_2O_3/Ta_2O_5複合薄膜以製備單相單層InTaO_4可見光啟動之光觸媒薄膜。實驗中先以雙靶濺鍍方式製成In_2O_3/Ta_2O_5複合薄膜,其中參數包括各層厚度及混和共鍍,最終再以不同溫度快速退火引發固態擴散反應製成所需之InTaO_4薄膜。薄膜檢測方式包括XRD、HRTEM、UV-VIS-NIR。結果顯示InTaO_4薄膜之形成與最初鍍膜方式有關,此應會影響退火溫度及時間。以此方法製備之InTaO_4薄膜顯示具有可見光光觸媒薄膜之特性。 |
英文摘要 | InTaO_4 films were prepared by alternative deposition of In_2O_3 and Ta_2O_5 layers, followed by rapid thermal annealing (RTA) in order to induce solid state diffusion. These oxide films showed a broader optical absorption than TiO_2 over the range of visible light and sufficient photocatalytic function under visible light illumination. The structure was examined using XRD and TEM. It is confirmed that stoichiometric InTaO_4 films can be produced by this hybrid approach. The optical absorption was measured by a UV-VIS-NIR spectrophotometer with wavelengths ranging from 300 to 900 nm. The visible light absorption is associated with the formation of crystalline oxide films during rapid thermal annealing. Lastly, the photocatalytic property of InTaO_4 films was gauged by the photodegradation test which measured the reduction of light absorbance affected by the decomposition of methylene blue under visible light irradiation. |
本系統中英文摘要資訊取自各篇刊載內容。