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題 名 | 商用鈦合金在不同氧分壓下之高溫氧化行為研究=High-Temperature Oxidation Behavior of Commercial Ti-Based Alloys at Various Oxygen Pressures |
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作 者 | 陳偉昇; 汪瑞芳; 邱宗聖; 開物; | 書刊名 | 防蝕工程 |
卷 期 | 23:3 2009.09[民98.09] |
頁 次 | 頁167-173 |
分類號 | 440.39 |
關鍵詞 | 商用鈦合金; 氧化行為; 拋物線律; TiO₂; Al₂O₃; Commercial Ti-based alloys; Oxidation behavior; Parabolic rate law; |
語 文 | 中文(Chinese) |
中文摘要 | 本研究主要在探討不同氧分壓(0.01~1atm)對兩種商用鈦合金Ti-64(含Ti-6Al-4V)及SP-700(含Ti-4.5Al-3V-2Mo-2Fe)在700~900℃間的氧化行爲。整體而言,兩種鈦合金的氧化動力學遵守拋物線律,且氧化速率皆隨溫度的上升而加快,但合金之氧化速率在氧分壓增加時呈現不規則變化,顯示合金氧化後的氧化生成物呈現N-型半導體的特徵。兩種合金氧化後主要生成TiO₂,並有少量Al₂O₃生成。 |
英文摘要 | The oxidation behavior of Ti-64 and SP-700 alloys was studied over the temperature range of 700~900 ℃ in various oxygen-containing atmospheres (at Po2=0.01~1atm). The oxidation kinetics of the two alloys followed the parabolic rate law in all cases. The oxidation rates of the alloys gradually increased with temperature but were independent of oxygen partial pressure, indicating that the scaling of the two alloys possessed an n-type semiconductivity. The scales formed on the alloys consisted mostly of TiO₂ and minor amounts of Al₂O₃, regardless of the oxygen pressure. |
本系統中英文摘要資訊取自各篇刊載內容。