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題名 | 結合雙光子吸收聚合化技術和電化學沉積技術製作硒化鎘微奈米結構=Fabrication of CdSe Micro/Nano Structures by Two Photon Absorption Induced Polymerization Technique Cooperated with Electrochemical Deposition Technique |
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作者姓名(中文) | 劉育松; 蔡忠憲; 陳柏文; 林建宏; 賴玉蝶; 巫晟逸; 許佳振; | 書刊名 | 科儀新知 |
卷期 | 29:6=164 2008.06[民97.06] |
頁次 | 頁7-19 |
專輯 | 雷射加工應用專題 |
分類號 | 448.5 |
關鍵詞 | 雙光子吸收聚合化技術; 電化學沉積技術; 硒化鎘; 微奈米結構; |
語文 | 中文(Chinese) |
中文摘要 | 在本文中,我們以自行架設的鈦藍寶石飛秒雷射,在負光阻SU8以及正光阻AZ4620中進行雙(多)光子曝光。利用雙(多)光子吸收光聚合化技術,我們成功地證實了此技術可以用來製作一維、二維和三維的微奈米週期性結構,並經由程式路徑規劃,可以加入任意的缺陷結構於週期性結構中。為了增加光子晶體的反射率,藉由電化學沉積技術,在雙光子曝光的模板中,沉積出高折射率的硒化鎘二維結構,再將高分子移除,用以增加折射率的對比,進而增加光子晶體的能隙寬度。 |
英文摘要 | In this report, a home-made Ti: sapphire femto-second laser was used as a light source to carry out two-photon (or multi-photon) polymerization on negative-tone SU8 and positive-tone AZ4620 photoresists. Using this technique we successfully fabricated one-, two-, and three-dimensionally periodic structures. Arbitrary types of defects can be introduced in these structures by arranging the exposed positions which were controlled by computer programs. To increase the index of refraction of photonic crystals, we used electric-deposition technique to deposit two-dimensional CdSe structures of a high refractive index on photoresist patterned substrates. Photoresists were then removed to increase the refractive index contrast to broaden the photonic bandgaps of photonic crystals. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。