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題名 | Effect of H[feaf]/CH[feb2] Ratios on the Structure and Properties of Coatings for Hermetically Carbon-coated Optical Fiber Prepared by Plasma Enhanced Chemical Vapor Deposition Method=氫氣/甲烷比例對以電漿輔助化學氣相沉積法製備碳密封鍍層光纖之鍍層結構與性質影響 |
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作者 | 林宏謙; 薛顯宗; 沈鼎瀛; 林昆明; Lin, Hung-chien; Shiue, Sham-tsong; Shen, Ting-ying; Lin, Kun-ming; |
期刊 | 興大工程學刊 |
出版日期 | 20060800 |
卷期 | 17:2 民95.08 |
頁次 | 頁75-85 |
分類號 | 440.34 |
語文 | eng |
關鍵詞 | 非晶質碳; 光纖; 結構; 電漿沉積; Amorphous carbon; Optical fibers; Structure; Plasma deposition; |