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題 名 | 步進機之覆蓋誤差參數評估=Estimation of Overlay Error Parameters for a Stepper |
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作 者 | 吳文章; | 書刊名 | 聯合學報 |
卷 期 | 16 1999.01[民88.01] |
頁 次 | 頁31-46 |
分類號 | 448.57 |
關鍵詞 | 步進機; 覆蓋誤差; 晶圓; 多線性回歸; Stepper; Overlay; Wafer; Multiple linear regression; |
語 文 | 中文(Chinese) |
中文摘要 | 步進機( stepper )由於光學系統性能限制,以及光罩裝置的不準確,均會造成 在曝光時,光罩圖案投影到晶圓表面產生影像變形。 本文從覆蓋誤差( overlay )分佈的 幾何特徵來探討步進機之覆蓋精度模式各誤差參數的物理意義,並以多線性最小平方回歸法 分析,比較利用不同覆蓋精度模式所求得之誤差參數評估值的差異性,以及對覆蓋誤差的改 善程度。 分析結果顯示,只要能夠建立適當的覆蓋精度模式,正確求出系統性誤差參數源,便可有效 改善覆蓋誤差。以本文之模擬分析為例,依多線性最小平方回歸法分析結果,去除這些誤差 參數,也就是找出造成覆蓋誤差之系統性原因並使之消失,如此可使殘留覆蓋誤差的標準差 統計值可降為原先覆蓋誤差的 19%,因而大幅改善覆蓋誤差。 |
英文摘要 | Due to limited optic system capability and inaccurate mask installation in a stepper, image distortion of mask pattern projected onto the wafer surface may occur during exposure. In this paper, overlay distribution geometry was analyzed to explore the physical properties of parameters in an overlay accuracy model for stepper. The multiple linear regression method was also used to analyze overlay models to compare the error parameters obtained by different overlay models and the extent of improvements on overlay. As long as an appropriate overlay accuracy model can be established to solve the systematic errors, overlay accuracy can be effectively improved. The multiple linear regression analysis of a simulation was conducted in this paper. The deletion of the systematic error parameters, that is finding out the causes of these systematic errors of overlay and eliminating them. This can reduce the standard deviation of residual overlay to 19% of the original overlay and significantly improve overlay. |
本系統中英文摘要資訊取自各篇刊載內容。