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頁籤選單縮合
題名 | 彩色濾光片黑色矩陣微影製程參數之研究=Process Optimization for Black Matrix Lithography of Color Filter |
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作者 | 陳正芳; 張志豪; Chen, Jeng-fung; Chang, Chih-hao; |
期刊 | 長榮大學學報 |
出版日期 | 20061200 |
卷期 | 10:2 民95.12 |
頁次 | 頁141-153 |
分類號 | 448.5 |
語文 | chi |
關鍵詞 | 實驗設計; 彩色濾光片; 微影製程; Design of experiments; Color filter; Lithography; |
中文摘要 | 由於行動電話及許多電子商品的顯示器由灰階轉換為全彩化,因而造成液晶顯示器 (Liquid Crystal Display; LCD) 產業在製程上的重大變革。彩色超扭轉型 (Color Super Twisted Nematic, C-STN) 面板與單色型面板製程的主要差異為彩色濾光片製程。濾光片的生產從基板清洗一直到最後的剝膜步驟,製造程序冗長繁瑣,因此製程的穩定性非常重要,尤其是第一道黑色矩陣 (Black Matrix :BM) 微影製程。BM微影製程若導致線寬超出規格,會造成濾光膜與黑色矩陣搭配發生畫素間漏光缺失。本文對濾光片的黑色矩陣微影製程做探討,使用實驗設計方法來探討影響線寛的變異因子,並以信號雜音比 (Signal to Noise Ratio;S/N) 作分析,找出製程之最佳參數,並將其導入生產中來提升製程的穩定性。 |
英文摘要 | Due to the change from the gray mode to the entire color of the mobile phone monitors leads to a great change of the manufacturing processes in liquid-crystal display industry. The main difference of the manufacturing between the color super twisted nematic (C-STN) panel and the gray mode panel is the color filter (CF) process. The manufacturing process for the color filter, starting from the substrate pre-treatment to the final resistor stripping step, is tremendously complicated and troublesome. Hence, process stability is extremely important, especially the black matrix (BM) lithography process. The manufacturing problem commonly encountered for the BM lithography process is the inconsistence of the line width, resulting in the exposed problem for the succeeding process. The purpose of this paper is to investigate the variation factors of the black matrix lithography process and apply the Taguchi method to obtain optimal process parameters by analyzing the ratio of signal to noise. Results show that process stability can be realized after implementing the obtained process parameters. |
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