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題 名 | 低同調光源之雙波長光干涉量測=Optical Interference Measurement Using Two Wavelengths of Low Coherence Light Source |
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作 者 | 童啟弘; 許華珍; | 書刊名 | 光學工程 |
卷 期 | 85 2004.03[民93.03] |
頁 次 | 頁83-92 |
分類號 | 471.7 |
關鍵詞 | 雙波長干涉術; 相移式干涉術; 低同調性光源; 細胞自動機械法; Mirau架構干涉儀; Two-wavelength interferometry; Phase-shifting interferometry; Low coherent light source; Cellular automata; Mirau-type interferometer; |
語 文 | 中文(Chinese) |
中文摘要 | 本論文描述一低同調性光源之雙波長光干涉量測技術,其結合了雙波長相移干涉術與白光干涉儀的優點,而具有較大階高量測範圍與使用低同調性光源等特性。由於本論文所述之雙波長光干涉量測技術搭配細胞自動機械法相位重建技術還原三維形貌,故能對物體的表面形貌參數等,提供精密快速的奈米級解析度,並達到快速精確奈米級的三維形貌量測。 |
英文摘要 | This paper presents an optical interference measurement technology using two wavelengths of low coherent light source. Its measuring setup combines the advantages of two-wavelength phase-shifting and white-light interferometer to have properties of wider range of step high measurement and using low coherence light source. Owing to this optical interference measurement technology collocates with cellular automata phase unwrapping technique to rebuilt three-dimensional profile, it provides accurate nano-order resolution for surface parameter to get up to quickly precision measurement of nanostructure of three-dimensional appearance. |
本系統中英文摘要資訊取自各篇刊載內容。