頁籤選單縮合
題 名 | 織物金屬化之研究=A Study of the Metalized Fabric |
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作 者 | 黃博雄; 彭兆群; 陳俊明; 陳宏恩; | 書刊名 | 紡織中心期刊 |
卷 期 | 12:4 2002.10[民91.10] |
頁 次 | 頁311-315 |
分類號 | 478.11 |
關鍵詞 | 真空濺鍍技術; 表面電阻率; 電磁波遮蔽率; Sputtering technology; Surface resistivity; Shielding effectiveness; |
語 文 | 中文(Chinese) |
中文摘要 | 本研究應用真空濺鍍技術,可產製兼具有織物輕、薄、強、韌特徵,同時又擁有金屬之低表面電阻率,小於10∘ohms/sq.與電磁波遮蔽率達到99.999%以上效果 之金屬化織物。真空濺鍍技術是將金屬靶材及基材(織物)在高度真空之電漿環境下,高能之氣體粒子撞擊金屬靶材,將金屬粒子撞離靶材表面,透過磁極引力,沉積於纖維結構物表面,因此擁有化學鍍產品的功能,卻無 廢污 水處理之問題,可應用於電磁遮蔽性材料暨應用產品的防護設計。 |
英文摘要 | The metalized fabrics which are accomplished by using the sputtering technology have not only the innate characteristic of lightness, thinness, strength, and toughness; but also have the smaller resistivity that is smaller than 10∘ohms per square (Ω /sq.) just like metal and shielding effectiveness above 99.999% .The sputtering technology is the deposition of particles vaporized from target where surface atoms are physically ejected by momentum transfer from an energetic bombarding particle which is usually a gaseous ion accelerated from a plasma. Sputter deposition can be deposited thin film metallization on fabric by magnetic field attraction in a vacuum or low pressure gas (10-5 torr) where the sputtered particles do not suffer gas phase collisions in the space between the target and the substrate. The function of the metalized fabrics is the same with electroless products but there is not any problem in stagnant water treatment. It is widely used to develop protection design of electromagnetic shielding materials and application products. |
本系統中英文摘要資訊取自各篇刊載內容。