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題名 | Global Model of Plasma Chemistry in a High Density Argon/Hydrogen Discharge=高密度氬氣/氫氣電漿反應器之模型研究 |
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作者 | 魏大欽; 楊智超; 鄭文正; | 書刊名 | Journal of the Chinese Institute of Chemical Engineers |
卷期 | 31:5 2000.09[民89.09] |
頁次 | 頁477-485 |
分類號 | 460.021 |
關鍵詞 | 高密度氬氣/氫氣電漿反應器; Plasma; Hydrogen; Argon; ECR; Modeling; |
語文 | 英文(English) |
中文摘要 | 本研究建立了高密度氬氣/氫氣電漿反應器之數學模型,首先求解波茲曼方程式以得到不同分配電場下之電子能量分布,再對反應器作質量及能量平衡,以求得不同壓力、電漿功率及進料組成下之電子溫度、電子密度與各中性物種之濃度。我們發現模型計算值與實驗值非常接近,加入氬氣於氫氣電漿中能增加電子溫度,進而增加氫氣解離之程度,研究中亦發現混合氬氣與氫氣之電漿其性質與純氫氣電漿相似,即使在含有70%氬氣之氫氣電漿中,H₃+離子依然是電漿中之主要離子,且電子溫度和氫原子濃度亦與純氫氣電漿時差異不大。 |
英文摘要 | A mathematical Model is developed to evaluate the influence of operating parameters on hydrogen dissociation and the nature of the major species present in Ar/H₂ plasmas. The Boltzmann equation is solved to obtain the electron energy distributions. Mass and energy conservation equations are then solved simultaneously to calculate the species density and electron temperature as a function of pressure, power, and feed composition. Good agreement is found between the model results and experimental measurements. The primary effect of argon addition to hydrogen plasma is to increase the electron density, which in turn enhances the degree of hydrogen dissociation. It is also found that Ar/H₂ plasma retains the basic properties of hydrogen plasma even for feed gases containing more than 70% argon. That is, values of electron temperature and H-atom density are similar, and the dominant ionic species is H₃+ ion. |
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