查詢結果分析
來源資料
第1筆 /總和 1 筆
/ 1 筆
頁籤選單縮合
題 名 | 三氧化鎢電變色特性之研究:靶-基距離效應=The Study of Electrochromic Performance for WO[feb0]: Effects of Varying Target-Substrate Distance |
---|---|
作 者 | 李維中; 朱正煒; 賀方涓; 方炎坤; | 書刊名 | 真空科技 |
卷 期 | 13:1 2000.03[民89.03] |
頁 次 | 頁15-19 |
分類號 | 440.33 |
關鍵詞 | 三氧化鎢膜; 電變色材料; 靶材; 基板; WO[feb0]; |
語 文 | 中文(Chinese) |
中文摘要 | 本文在於研究利用反應式直流磁控濺鍍系統(DC Reactive Magnetron Sputtering System)所沈積出的電變色材料:三氧化鎢(WO3)膜,其電變色特性及表面型態(Surface Morphology)受靶材(Target)至基板間距離之影響性。發現三氧化鎢膜在電變色過程的光密度改變(Optical Density Change)強烈受靶材至基板間距離之影響。藉由原子力顯微鏡(Atomic Force Microscope)的表面量測,發現在較遠的靶與基板距離下所沈積出的三氧化鎢膜的表面結構,比在較近的靶與基板距離所沈積出者較阻糙、較多孔隙及較多柱狀的表面結構,這是一般做為固態電變色材料所需的表面結構。 |
英文摘要 | In this paper, the surface morphology of the tungsten trioxide (WO3) thin films sputtered by a dc reactive magnetron sputtering system with widely varying the target-substrate distances was investigated. The optical density change (△OD) of the films to be strongly affected by the target-substrate distance was found. By using atomic force microscope (AFM) to indentify the surface porosity of the sputtered WO3 films, we found that the film at longer target-substrate distance was rough, porous, and having columman-like morphology, thus offering a good electrochromic performance for opto-switching applications. |
本系統中英文摘要資訊取自各篇刊載內容。