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題 名 | Analysis of Overlay Accuracy Error Parameters=覆蓋精度誤差參數分析 |
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作 者 | 林榮慶; 吳文章; | 書刊名 | Proceedings of the National Science Council : Part A, Physical Science and Engineering |
卷 期 | 22:2 1998.03[民87.03] |
頁 次 | 頁261-271 |
分類號 | 448.57 |
關鍵詞 | 覆蓋精度; 積體電路; Stepper; Overlay; Alignment; Error parameters; |
語 文 | 英文(English) |
中文摘要 | 覆蓋精度(overlay)控制為積體電路製造的關鍵設計準則之一。本文將探討覆蓋 精度之數學模式,研究步進機(stepper)之光罩與晶圓(wafer)對準不正確對覆蓋誤差的影 響。在本文的分析方法中,深入討論各獨立參數(parameter)與覆蓋誤差之間的關係, 包括各獨立參數造成覆蓋誤差的幾何特徵,分析曝光場(image field)形狀改變、曝光場 大小改變、以及樣本(samples)取樣數目改變等對覆蓋誤差的影響。 結果顯示,在幾何特徵方面,曝光源與光罩之配合誤差(intrafield sources)所造成之覆 蓋誤差與曝光場大小有關,而光罩與晶圓之配合誤差(interfield sources)則和曝光場的位 置有關,因此晶圓直徑越大,曝光場距離晶圓中心越遠其覆蓋誤差越大。在統計資料 特性方面,得到的結論是曝光場大小相同下,正方形的曝光場設計優於長方形。光罩 與晶圓之配合誤差對覆蓋誤差的靈敏度大於曝光源與光罩之配合誤差,當曝光場的面 債及晶圓直徑越大,高階誤差參數對覆蓋精度的影響越加重要。本文分析方法可作為 步進機在控制覆蓋精度峙,配合曝光場的大小及形狀,選擇影響較大的獨立參數來加 以控制。 |
英文摘要 | The control of overlay tolerance is one of the key design rules in the manufacturing of integrated circuits. This paper explores the mathematical model of overlay accuracy and examines the effects of a stepper mask and inaccurate wafer positioning on the overlay. The analysis in this paper includes an in-depth discussion of the relationship between every independent parameter and the overlay, including the overlay geometry due to various parameters, analysis of chances in the shape of the image field. changes in the field size and the effect of changes in the number of samples on the overlay. The findings indicate that in terms of the geometry. the overlay of intrafield sources is related to the field size while that of interfield sources is related to the field position. Therefore. the larger the wafer diameter is. the greater is the distance between the field and wafer center, and the larger is the overlay. In terms of statistical data characteristics, the conclusion is that given the same field size. a square image field design is superior to a rectangle design. The sensitivity of interfield sources to the overlay is greater than that of intrafield sources. The greater the image field area and the larger the wafer diameter is, the more important is the effect of high-order parameters on the overlay. These findings can be used, in conjunction with the size and shape of the image field, to select parameters which will be effective in controling the overlay accuracy of the stepper. |
本系統中英文摘要資訊取自各篇刊載內容。