查詢結果分析
相關文獻
- Characterization of Bimetallic Ni-Rh/SiO[feaf]Catalysts by [feb4]H Solid State NMR Spectroscopy
- Partial Hydrogenation of Benzene: A Review
- A Theoretical Model for Phase Transfer Catalyzed Reaction with the Third-Liquid Phase
- 利用茂金屬合成聚乙烯之動力學研究
- 影響觸媒焚化之主要因素及操作維護注意事項之探討
- 化工清潔製程技術
- 光觸媒纖維應用
- 影響金烯觸媒催化sPS聚合反應速率的物質及其去除方法的探討
- 工業異相氫化觸媒
- 工業觸媒失活現象之分類和鑑定
頁籤選單縮合
題 名 | Characterization of Bimetallic Ni-Rh/SiO[feaf]Catalysts by [feb4]H Solid State NMR Spectroscopy=利用氘核固態核磁共振光譜儀研究雙金屬 Ni-Rh/SiO[feaf]觸媒 |
---|---|
作 者 | 呂芳欽; 張聰慧; | 書刊名 | Journal of the Chinese Institute of Chemical Engineers |
卷 期 | 30:1 1999.01[民88.01] |
頁 次 | 頁81-85 |
分類號 | 468.8 |
關鍵詞 | 氘核固態核磁共振光譜儀; 觸媒; Ni-Rh/SiO[feaf]; Bimetallic catalysts; [feb4]H NMR; Thermomagnetometry; |
語 文 | 英文(English) |
中文摘要 | 利用初期潤溼法製備Ni-Rh/SiO/sub 2/, Rh/SiO₂,及Ni/SiO₂觸媒,並用氘核固態核磁共振光譜儀和熱磁法研究它們的之性質。結果顯示, Ni/SiO₂觸媒的居禮溫度出現在635K;但Ni-Rh/SiO₂觸媒則觀測不到居禮溫度。由氘核固態核磁共振光譜顯示,Rh/SiO₂,及Ni/SiO₂觸媒的化學位移在300 torr的氘氣下分別為-30ppm及-60ppm,而Ni-Rh/SiO₂觸媒的化學位移則出現在較低磁場的方地。此外,Ni-Rh/SiO₂觸媒的化學位移亦受Ni/Rh比的影響。當Ni/Rh比增高時,則化學位移往高磁場方向位移,最終在Ni/Rh=5時為-38ppm。以上這些現象是由於Ni-Rh/SiO₂觸媒中的Ni與Rh形成了Ni-Rh合金的緣故。 |
英文摘要 | Catalysts of Ni-Rh/SiO₂, Rh/SiO₂, and Ni/SiO₂ were prepared by the incipient wetness method and characterized with techniques of thermomagnetometry and ²H NMR spectroscopy. The Ni/SiO₂ showed a Curie temperature around 635K. On the contrary, no Curie transition temperature was observed for all the Rh-Ni/SiO₂ catalysts. Observed chemical shifts of deuterium adsorbed on Ni/SiO₂ and Rh/SiO₂ catalysts were -38 and-60ppm, respectively, under 300 Torr D₂, while the bimetallic Ni-Rh/SiO₂ catalysts showed a more downfield shift. Further, the observed chemical shift for the bimetallic catalysts also showed a Ni/Rh ratio dependent and shifted toward upfield with Ni/Rh ratio; the chemical shift finally approached that of Ni/SiO₂ ( -38ppm) as the Ni/Rh ratio was higher than five. These occurrences were attributed to the formation of bimetallic Ni-Rh alloy. |
本系統中英文摘要資訊取自各篇刊載內容。