頁籤選單縮合
題 名 | Photorearrangement of Propargyl Bromide as a Probe to Study Propargylic and Allenic Radicals by Infrared Matrix Isolation Technique |
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作 者 | 吳裕文; 黃美利; 許偉亮; 方惠芬; | 書刊名 | Journal of the Chinese Chemical Society |
卷 期 | 45:2 1998.04[民87.04] |
頁 次 | 頁307-312 |
分類號 | 340 |
關鍵詞 | Radical; Infrared matrix isolation; Propargyl bromide; Allenyl bromide; 3-d-propargyl bromide; Rearrangement; |
語 文 | 英文(English) |
英文摘要 | The photolysis of propargyl bromide in Ar matrix to form allenyl bromide proceeded with a radical mechanism. The deuterium label study and radical scavenger were used to investigate the mechanism. Neither propargyl nor allenyl radical was trapped in Ar matrix at 8K. The rates of propargyl and allenyl radicals coupled with bromo radical are significantly fast. The stability of propargyl and allenyl radicals is discussed. |
本系統中英文摘要資訊取自各篇刊載內容。