頁籤選單縮合
題名 | 以環境友善觸媒處理溶液中之過氧化氫=Removal of Hydrogen Peroxide in Liquid Phase with Environment Friendly Catalyst |
---|---|
作 者 | 郭峻男; 李承軒; 鄭明敏; 傅崇瑋; 賴宇倫; 顏紹儀; | 書刊名 | 潔淨科技 |
卷期 | 51 2024.02[民113.02] |
頁次 | 頁10-15 |
分類號 | 468.8 |
關鍵詞 | Hydrogen peroxide; H₂O₂; Oxidation catalyst; Supporter; |
語文 | 中文(Chinese) |
中文摘要 | 半導體製程中 Piranha Clean(SPM)、CMP、濕法刻蝕、CWD (腐蝕性廢水排放,pH=10~11)等產生的廢硫酸(40~70%)和 廢水,因含有 1~6%的過氧化氫(H 2O2),導致不易回收再利用,原因來自於 H 2O 2 的強氧化能力及易分解產生氧氣而 致爆炸的風險。現今的處理技術「藉由低劑量鹽酸進行催化降解」及「添加 Na 2S2O 3 以去除廢水中的過氧化氫」─ ─前者反應過程除劇烈放熱外,更會生成高毒性氯氣;後者則會產生 NaHSO4 和 Na 2 SO 4 等副產物。目前的處理方 法不僅消耗大量化學品,同時也需要較長的反應時間,導致較多能源損耗。本研究聚焦在經改質的活性炭球作為 H 2O 2 的氧化分解觸媒,可在室溫和 1 大氣壓的環境下催化分解廢酸和廢水中的 H 2 O2,產物僅水及氧氣,去除效率 達到>98%。通過 SEM 和 ICP 的量測與分析,可觀察 H 2O 2 氧化觸媒的形貌和含量在反應過程中沒有變化。H 2 O 2 去 除技術為環境保護提供了一種經濟省能的方法,並已技轉廠商進行商業用途。 |
英文摘要 | The waste sulfuric acid (40~70%) and water containing 1~6% hydrogen peroxide from the process of Piranha Clean (SPM) , CMP, wet etching and CWD (caustic wastewater drains, pH=10~11) in semiconductor sector cannot be recycled and reused due to strong oxidation capability of hydrogen peroxide. In the contemporary treatment technology, HCl is added to react with hydrogen peroxide in acid, which results in chlorine as byproduct and further washing process is needed. On the other hand, Na 2S2O 3 is added to remove H 2O 2 in waste water, which produces NaHSO 4 and Na 2SO 4 as chemical waste. These present methods consume large amount of chemical, need long reaction time and cause huge energy consumption. This study investigates that modified activated carbon beads, both in concentrated sulfuric acid solution and waste water, are able to catalytically decompose hydrogen peroxide to water and oxygen, reaching >98% removal efficiency at room temperature and under 1 atm. The morphology and content of catalyst were also observed without any change through the analysis by SEM and ICP. This H 2O 2 removal technique provides an economical method for environment protection and energy saving. which has been transferred to one local company for its application in related industries. |
本系統之摘要資訊系依該期刊論文摘要之資訊為主。